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A Low Temperature CVD Process for TiN Coatings
Published online by Cambridge University Press: 21 February 2011
Abstract
A novel low temperature process for the chemical vapour deposition of titanium nitride films has been developed. Titanium sub-halides generated “in situ” by chlorination of titanium pellets are subsequently reacted with ammonia at reduced pressure and temperatures of 450–600° C. The coatings have excellent adhesion and wear resistance. A description of the process and the properties of the coatings produced by it will be presented.
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- Copyright © Materials Research Society 1990
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