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Investigation of CVD β-SiC Surfaces Produced VIA a “Novel” Surface Replication Process

Published online by Cambridge University Press:  21 February 2011

Aliki K. Collins ,
Joseph T. Keeley ,
Michael A. Pickering  and
Raymond L. Taylor
Aliki K. Collins
Affiliation:
Morton International/CVD Inc., Woburn, MA 01810
Joseph T. Keeley
Affiliation:
Morton International/CVD Inc., Woburn, MA 01810
Michael A. Pickering
Affiliation:
Morton International/CVD Inc., Woburn, MA 01810
Raymond L. Taylor
Affiliation:
Morton International/CVD Inc., Woburn, MA 01810
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Abstract

A novel replication process for silicon carbide surfaces has been developed. A polished polycrystalline chemical vapor deposited (CVD) β-SiC surface was reproduced from a SiC substrate (mandrel) by a two-step pretreatment process followed by CVD of SiC. In this paper we describe the process and present characterization data for both the substrate and the replicated surfaces. Based on the characterization results, we have developed a model which describes the chemical reactions that occur during the replication process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 168 , 1989 , 193
Copyright
Copyright © Materials Research Society 1990

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References

1.Schlichting, J., Powd. Met. Int. 12, 145 (1980).Google Scholar
2.Saxena, Ram R. and Bragg, R.H., Carbon 16, 373 (1978).Google Scholar
3.Jenkins, G.M. and Kawamura, K., Polymeric Carbons-Carbon Fibre, Glass and Char (Cambridge University Press, Cambridge, England 1976).Google Scholar
4.Baranov, A.V., Bobovich, Va. S. and Petrov, V.I., Opt. Spectrosc. (USSR) 63(5), 606 (1987).Google Scholar
5.Collins, A. K., Keeley, J. T., Pickering, M.A., and Taylor, R.L., to be published.Google Scholar
6.Muehlhoff, L., Choyke, W.J., Bozack, M.J. and John Yates, T. Jr., J. Appl. Phys. 60(8), 2842 (1986).Google Scholar
7.Fung, C.D. and Kopanski, J.J., Appl. Phys. Lett. 45(7), 757 (1984).Google Scholar