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Interlayer Spacing of Sputter Deposited Vanadium Pentoxide
Published online by Cambridge University Press: 26 February 2011
Abstract
Vanadium pentoxide films were grown by sputtering a V target in O2-bearing atmospheres containing 0 to 98% Ar. The interlayer spacing was siudied as a function of sputtering gas 02 content. The results are discussed in terms of defects in thevanadyl 0 layir and correlated with target surface oxidation.
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- Copyright © Materials Research Society 1987
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