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Interfacial Defect Control for Infrared Conversion Widening of Silicon Single-Crystal Solar Cells

Published online by Cambridge University Press:  15 February 2011

Z. T. Kuznicki*
Affiliation:
CNRS, Laboratoire PHASE (UPR 292), BP 20, 67037 STRASBOURG CEDEX 2 (France), kuznicki@frcpnl 1.in2p3.fr
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Abstract

A multi-interface solar cell design exploiting the parts of solar spectrum heretofore never converted by single-crystal silicon devices seems to be possible with local material modifications combined with a superimposition of hetero-interface transition zones. Possible structural modifications by implantation of a silicon single-crystal target causes a series of “secondary” effects of basic importance from the photovoltaic conversion point of view. The 1800 nm divacancy infrared band activity has revealed totally unknown behavior in the built-in strain field of the inserted α-Si/c-Si hetero-interface. First, even an annealing temperature of 770 K is not enough to quench the divacancy absorption. Next, the elimination of useful band-tail and useless divacancy activities is not coincident, i.e. divacancy absorption can be quenched without too much reduction of the band-tail activity. A relatively important infrared current could be observed experimentally up to 2500 nm and by extrapolation up to about 3500 nm.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

1. Grittler, G., Queisser, H.J., Energy Conversion, 10(1970)5155.Google Scholar
2. Summonte, C., Biavati, M., Gabilli, E., Galloni, R., Guerri, S., Rizzoli, R., Appl. Phys. Lett., 63(1993)785787.Google Scholar
3. Tsuo, Y.S., Wu, X., Alleman, J.L., Li, X., Qu, Y., Ciszek, T.F., Hollinsworth, R.E., Bhat, P.K., 23rd IEEE Photovoltaic Spec. Conf., Louisville, USA, 10–14 May 1993, pp. 281–285.Google Scholar
4. Kuznicki, Z.T., Appl. Phys., 74(1993), pp. 20582063 and Z.T.Kuznicki, J.C.Muller, M.Lipinski, 23rd IEEE Phot. Spec. Conf., Louisville, 10–14 May 1993, pp. 327–331.Google Scholar
5. Kuznicki, Z.T., Wu, L., Grob, J.–J., Ventura, L., 12th EC PV Solar Energy Conf., 1994, pp. 1056–1059 and Z.T.Kuznicki, L.Wu, J.–J.Grob, J.C.Muller, Is World Conference on Photovolatic Energy Conversion (WCPEC), Hawaii, USA, 5–9 December 1994, in press, and Z.T.Kuznicki, J.–J.Grob, L.Wu, Appl. Phys. Lett., in press.Google Scholar
6. Cheng, L.J., Corelli, J.C., Corbett, J.W., Watkins, G.D., Phys. Rev., 152(1966)761770.Google Scholar
7. Zammit, U., Madhusoodanan, K.N., Marinelli, M., Scudieri, F., Mercuri, F., Wendler, E., Wesch, W., Nucl. Instr. and Meth. in Phys. Res., B96(1995)241244.Google Scholar
8. Gyulai, J., Radiation Damage and Annealing in Ion Implantation, in Ziegler, J.F. Ed., Handbook of Ion Implantation Technology, North-Holland, Amsterdam, 1992.Google Scholar
9. Csepregi, L., Kennedy, E.F., Gallagher, T.J., Mayer, J.W., Sigmon, T.W., J. Apph. Phys., 48(1977)42344240.Google Scholar