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Integration of Top-Down and Bottom-Up Nanofabrication Schemes

Published online by Cambridge University Press:  26 February 2011

Pascale Maury ,
Olga Crespo-Biel ,
Maria Peter ,
David N. Reinhoudt  and
Jurriaan Huskens
Pascale Maury
Affiliation:
[email protected]
Olga Crespo-Biel
Affiliation:
[email protected]
Maria Peter
Affiliation:
[email protected]
David N. Reinhoudt
Affiliation:
[email protected]
Jurriaan Huskens
Affiliation:
[email protected]
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Abstract

The fabrication of 3D nanostructures, which have tunable, sub-100 nm dimensions in all three directions, is a key issue of nanotechnology. Here we describe the integration of top-down nanoimprint lithography (NIL) and bottom-up layer-by-layer (LBL) assembly for the preparation of 3D hybrid nanostructures. NIL provided down to sub-100 nm poly(methylmethacrylate) (PMMA) structures. These were employed to fabricate patterned self-assembled monolayers of cyclodextrin (CD) host molecules on silicon oxide . The consecutive LBL assembly with adamantyl guest-functionalized dendrimers and CD-modified gold nanoparticles resulted in patterned multilayer structures with thicknesses of 3-30 nm. The x,y control by NIL and the z control by LBL assembly ultimately allowed the fabrication of circular structures with a radius of 25 nm and a thickness of 20 nm. The integration of the two methods has thus yielded a versatile 3D nanofabrication methodology comprising of 10-40 process steps.

Keywords

nanostructuresurface chemistrylithography (deposition)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 901: Symposium R – Assembly at the Nanoscale – Toward Functional Nanostructured Materials , 2005 , 0901-Rb12-01
Copyright
Copyright © Materials Research Society 2006

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