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Infrared Spectroscopy of Si(111) and Si(100) Surfaces After HF Treatment: Hydrogen Termination and Surface Morphology

Published online by Cambridge University Press:  25 February 2011

Y. J. Chabal ,
G. S. Higashi  and
K. Raghavachari
Y. J. Chabal
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
G. S. Higashi
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
K. Raghavachari
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
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Abstract

The methodology for extracting structural information from surface infrared spectra is exemplified by considering the silicon-hydrogen stretching modes of flat and vicinal Si(111) and Si(100) surfaces obtained after HF treatment.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 131: Symposium E – Chemical Perspectives of Microelectronic Materials I , 1988 , 191
Copyright
Copyright © Materials Research Society 1989

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References

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