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High Speed InAs/AlSb and In0.53Ga0.47As/AlAs Resonant Tunneling Diodes

Published online by Cambridge University Press:  25 February 2011

D. H. Chow
Affiliation:
Hughes Research Laboratories, 3011 Malibu Canyon Rd., Malibu, CA 90265
J. N. Schulman
Affiliation:
Hughes Research Laboratories, 3011 Malibu Canyon Rd., Malibu, CA 90265
E. ÖZBAY
Affiliation:
Edward L. Ginzton Laboratory, Stanford University, Stanford, CA 94305
D. M. Bloom
Affiliation:
Edward L. Ginzton Laboratory, Stanford University, Stanford, CA 94305
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Abstract

We report a comparison of InAs/AlSb and In0.53Ga0.47As/AlAs resonant tunneling diodes (RTDs) for high speed switching applications. Theoretical simulations are performed for both heterostructure systems using a two band tunneling model, which includes the effects of strain and band bending. Experimental peak current densities are observed to agree well with the calculated values over the range 1×104 A/cm2 to 5× 105 A/cm2. In both types of structures, the maximum peak current density (directly related to switching speed) is determined by device heating. In this regard, InAs/AlSb RTDs are found to be slightly superior to In0.53Ga0.47As/AlAs RTDs due to the low contact and series resistances of InAs. However, higher peak-to-valley ratios and swing voltages are obtained in the In0.53Ga0.47As/AlAs devices up to their maximum attainable peak current density (3.1×105 A/cm2 in this study). Both heterostructure systems yield RTDs with estimated switching times near 1 ps.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

1. Söderström, J.R., Brown, E.R., Parker, C.D., Mahoney, L.J., Yao, J.Y., Andersson, T.G., and McGill, T.C., Appl. Phys. Lett. 54, 153 (1989).Google Scholar
2. Broekaert, T.P.E. and Fonstad, C.G., Proceedings of the International Electron Devices Meeting, 1989, p. 559.Google Scholar
3. Kapre, R.M., Madhukar, A., and Guha, S., Appl. Phys. Lett. 58, 2255 (1991).Google Scholar
4. Whitaker, J.F., Mourou, G.A., Sollner, T.C.L.G., and Goodhue, W.D., Appl. Phys. Lett. 53, 385 (1988).Google Scholar
5. Özbay, E., Diamond, S.K., and Bloom, D.M., Electron. Lett. 26, 1046 (1990).Google Scholar
6. Diamond, S.K., Özbay, E., Rodwell, M.J.W., Bloom, D.M., Pao, Y.C., and Harris, J.S., Appl. Phys. Lett. 54, 153 (1989).Google Scholar
7. Özbay, E., Bloom, D.M., Chow, D.H., and Schulman, J.N., unpublished.Google Scholar
8. Schulman, J.N. and Waldner, M., J. Appl. Phys. 63, 2859 (1988).Google Scholar
9. Chow, D.H., Schulman, J.N., Özbay, E., and Bloom, D.M., Appl. Phys. Lett. 61, 1685 (1992).Google Scholar