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Fragmentation of C60 Molecules in Partially Ionized Fullerene Beam Deposition

Published online by Cambridge University Press:  15 February 2011

Zhong-Min Ren
Affiliation:
Department of Physics, Fudan University, Shanghai, 200433, P.R. China
Xia-Xing Xiong
Affiliation:
Department of Physics, Fudan University, Shanghai, 200433, P.R. China
Yuan-Cheng Du
Affiliation:
Department of Physics, Fudan University, Shanghai, 200433, P.R. China
Zhi-Feng Ying
Affiliation:
Department of Physics, Fudan University, Shanghai, 200433, P.R. China
Liang-Yao Chen
Affiliation:
Department of Physics, Fudan University, Shanghai, 200433, P.R. China
Fu-Ming Li
Affiliation:
Department of Physics, Fudan University, Shanghai, 200433, P.R. China
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Abstract

C60 films have been deposited using a partially ionized cluster beam deposition (PIBD) technique. The experimental results show that as Va. exceeds about 400 V almost all the C60 molecules fragmentate at collision with the substrate and the obtained films turn to be amorphous carbon layers at elevated Va, indicated by measurements of Raman spectra, X-ray diffraction, and ellipsometry.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

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