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Features of Semiconductors during Nanoindentation
Published online by Cambridge University Press: 15 February 2011
Abstract
Si and InSb were subject to depth sensing multi-cycling nanoindentation. The load-depthcurves exhibited hysteresis loops which are explained in terms of pressure induced phase transformations. In order to study the impact of crystal distortions on phase transformation, the specimens were subject to boron implantation (ion energy 180 keV) of different implantation doses (1014 to 1017 ions/cm2) and indented without annealing. In InSb, the hysteresis loops disappeared after implantation of 1016 ions/cm2, and for Si with its stronger bonds, a dose of 3*1016/cm2 is required for the same effect. Indentation cycling with constant maximum load results in a sudden disappearance of the hysteresis loop after a small gradual loop area reduction during the first initial cycles.
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- Copyright © Materials Research Society 2003
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