Hostname: page-component-78c5997874-ndw9j Total loading time: 0 Render date: 2024-11-20T05:46:27.391Z Has data issue: false hasContentIssue false
  • English
  • Français

Erbium Ion Implantation for Optical Doping

Published online by Cambridge University Press:  22 February 2011

A. Polman
A. Polman*
Affiliation:
FOM-Institute for Atomic and Molecular Physics Kruislaan 407, 1098 SJ Amsterdam, The Netherlands
Get access

Abstract

Erbium is a rare-earth ion which, when incorporated in a solid in the trivalent state, shows characteristic intra-4f emission at 15 µm, an important telecommunication wavelength. A review is given of recent work in the area ofEr ion implantation into soda-lime silicate and AI2O3 optical waveguide films, LiNbO3 and silicon. Structural and optical characteristics are discussed and future challenges for this exciting new field are described.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 316: Symposium A – Materials Synthesis and Processing Using Ion Beams , 1993 , 385
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Ainslie, B.J., J. Lightwave Technol. 9, 220 (1991).Google Scholar
2 Desurvire, E., Simpson, J.R., and Becker, P.C., Opt. Lett. 12, 888 (1987).Google Scholar
3 Miya, et al. , Electron. Lett. 15, 108 (1979).Google Scholar
4 Henry, C.H., Blonder, G.E., and Kazarinov, R.F., J. Lightwave Technol. 7, 1530 (1989).Google Scholar
5 Boyd, J.T., Ed., Integrated Optics: devices and Applications (IEEE, New York, NY, 1990).Google Scholar
6 Brinkmann, R., Sohler, W., and Suche, H., Electr. Lett. 27, 415 (1991).Google Scholar
7 Becker, P., Brinkmann, R., Dinand, M., Sohler, W., and Suche, H., Appl. Phys. Lett. 61, 1257 (1992).Google Scholar
8 Suche, H., Baumann, I., Hiller, D., and Sohler, W., Proc. 6th European Conference on Integrated Optics, Neuchâtel, April 1993, postdeadline paper 3 (1993).Google Scholar
9 Snoeks, E., van den Hoven, G.N., and Polman, A., J. of Appl. Phys. 73, 8179 (1993).Google Scholar
10 Snoeks, E., van den Hoven, G.N., Polman, A., Hendriksen, B., and Diemeer, M.B.J., Proc. 6th European Conference on Integrated Optics, Neuchâtel, April 1993, p. 3–38.Google Scholar
11 Smit, M.K., Acket, G.A., and van der Laan, C.J., Thin Solid Films, 138, 171 (1986).Google Scholar
12 van den Hoven, G.N., Polman, A., Alves, E. and Soares, J.C., to be published.Google Scholar
13 van den Hoven, G.N., Snoeks, E., Polman, A., van Uffelen, J.W.N., Oei, Y.S., and Smit, M.K., Appl. Phys. Lett. 62, 3065 (1993).Google Scholar
14 van den Hoven, G.N., Snoeks, E., Polman, A., van Uffelen, J.W.M., and Smit, M.K., Proc. 6th European Conference on Integrated Optics, Neuchâtel, April 1993, p. 3–36.Google Scholar
15 Fleuster, M., Buchal, Ch., Snoeks, E., and Polman, A., J. Appl. Phys., in press.Google Scholar
16 Fleuster, M., Buchal, Ch., Snoeks, E., and Polman, A., Mat. Res. Soc. Proc. 316 (1994).Google Scholar
17 Fleuster, M., Buchal, Ch., Snoeks, E., and Polman, A., submitted to Appl. Phys. Lett. Google Scholar
18 Ennen, H., Schneider, J., Pomrenke, G., and Axmann, A., Appl. Phys. Lett. 43, 943 (1983).Google Scholar
19 Ennen, H., Pomrenke, G., Axman, A., Eisele, K., Haydl, W., and Schneider, J., Appl. Phys. Lett. 46, 381 (1985).Google Scholar
20 Ren, F.Y.G., Michel, J., Sun-Paduano, Q., Zheng, B., Kitagawa, H., Jacobson, D.C., Poate, J.M., and Kimerling, L.C., Mat. Res. Soc. Proc. 301, 87 (1993).Google Scholar
21 Xie, Y.-H., Fitzgerald, E.A., and Mii, Y.J., Appl. Phys. Lett. 70, 3223 (1991).Google Scholar
22 Polman, A., Custer, J.S., Snoeks, E., and van den Hoven, G.N., Appl. Phys. Lett. 62, 507 (1993).Google Scholar
23 Custer, J.S., Polman, A., and van Pinxteren, M.H., J. Appl. Phys., in press.Google Scholar
24 Polman, A., Custer, J.S., and Serna, R., submitted to J. Appl. Phys. Google Scholar
25 Polman, A., Custer, J.S., Snoeks, E., and van den Hoven, G.N., Nucl. Instr. and Meth. B 80/81, 653 (1993).Google Scholar
26 Favennec, P.N., l'Haridon, H., Moutonnet, D., Salvi, M., and Gauneau, M., Jap. J. Appl. Phys. 29, L524 (1990).Google Scholar
27 Michel, J., Benton, J.L., Ferrante, R.F., Jacobson, D.C., Eaglesham, D.J., Fitzgerald, E.A., Xie, Y.-H., Poate, J.M., and Kimerling, L.C., J. Appl. Phys. 70, 2672 (1991).Google Scholar
28 Priolo, F., Coffa, S., Franzó, G., Spinella, C., Camera, A., and Bellani, V., Journ. Appl. Phys, in press.Google Scholar
29 Adler, D.L., Jacobson, D.C., Eaglesham, D.J., Marcus, M.A., Benton, J.L., Poate, J.M., and Citrin, P.H., Appl. Phys. Lett. 61, 2181 (1992).Google Scholar
30 Coffa, S., Franzó, G., Priolo, F., Polman, A., and Serna, R., submitted to Phys. Rev. B. Google Scholar
31 Priolo, F., Franzó, G., Coffa, S., Polman, A., Bellani, V., Carnera, A. and Spinella, C., Mat. Res. Soc. Proc. 316 (1994), and F. Priolo, G. Franzó, S. Coffa, A. Polman, V. Bellani, and A. Carnera, submitted to Appl. Phys. Lett.Google Scholar
32 Serna, R., Snoeks, E., van den Hoven, G.N., and Polman, A., J. Appl. Phys., in press.Google Scholar
33 Lombardo, S., Campisano, S.U., van den Hoven, G.N., Cacciato, A., and Polman, A., Appl. Phys. Lett. 63, 1941 (1993).Google Scholar
34 Lombardo, S., Campisano, S.U., van den Hoven, G.N., and Polman, A., to be published.Google Scholar
35 van den Hoven, G.N., Polman, A., Lombardo, S., and Campisano, S.U., to be published.Google Scholar
36 Polman, A., Jacobson, D.C., Eaglesham, D.J., Kistler, R.C., and Poate, J.M., J. of Appl. Phys. 70, 3778 (1991).Google Scholar
37 Polman, A. and Poate, J.M., J. of Appl. Phys. 73, 1669 (1993).Google Scholar
38 Marcus, M.A. and Polman, A., J. of Non-Cryst. Solids 136, 260 (1991).Google Scholar
39 Lumholt, O., Bemas, H., Chabli, A., Chaumont, J., Grand, G., and Valette, S., Electron. Lett. 28, 2243 (1992).Google Scholar
40 Schubert, E.F., Vredenberg, A.M., Hunt, N.E.J., Wong, Y.H., Becker, P.C., Poate, J.M., Jacobson, D.C., Feldman, L.C., and Zydzik, G.J., Appl. Phys. Lett. 61, 1381 (1992).Google Scholar
41 Vredenberg, A.M., Hunt, N.E.J., Schubert, E.F., Jacobson, D.C., Poate, J.M., and Zydzik, G.J., Phys. Rev. Lett. 71, 517 (1993).Google Scholar
42 Custer, J.S., Snoeks, E. and Polman, A., Mat. Res. Soc. Symp. Proc. 235, 51 (1992).Google Scholar
43 Isshiki, H., Saito, R., Kimura, T., and Ikoma, T., J. Appl. Phys. 70, 6993 (1991).Google Scholar
44 Rochaix, C., Rolland, A., Favennec, P.N., Lambert, B., le Corre, A., l'Haridon, H., and Salvi, M., Jap. J. Appl. Phys. 27, L2348 (1988).Google Scholar
45 Pomrenke, G.S., Ennen, H., and Haydl, W., J. Appl. Phys. 59, 601 (1986).Google Scholar
46 Klein, P.B., Moore, F.G., and Dietrich, H.B., Appl. Phys. Lett. 58, 502 (1991).Google Scholar
47 Mater. Res. Soc. Proc. 301 (1993).Google Scholar