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Epitaxy and Crystallographic Texture of Thin Films for Magnetic Recording

Published online by Cambridge University Press:  15 February 2011

David E. Laughlin ,
Y.C. Feng ,
Li-Lien Lee  and
B. Wong
David E. Laughlin
Affiliation:
Data Storage Systems Center, Carnegie Mellon University, Pittsburgh, PA 15213
Y.C. Feng
Affiliation:
Data Storage Systems Center, Carnegie Mellon University, Pittsburgh, PA 15213
Li-Lien Lee
Affiliation:
Data Storage Systems Center, Carnegie Mellon University, Pittsburgh, PA 15213
B. Wong
Affiliation:
Materials Science and Engineering Department, Carnegie Mellon University
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Abstract

Thin films for magnetic recording are usually deposited on metallic Cr underlayers to control their crystallographic texture and other microstructural features such as grain size and crystal perfection. In this paper, the mechanisms involved in the production of thin films (both underlayers and magnetic layers) with specific crystallographic textures is reviewed and discussed. We first present an overview of a model for the development of the initial crystallographic texture of films grown on amorphous substrates. The textures that various films develop during growth are next discussed followed by a review of the role of epitaxy of Co-alloy films on Cr with underlayers and interlayers. The control of grain size of the magnetic film is also discussed in light of the underlayer grain size. Finally, the role of epitaxy on crystalline perfection and subgrain structure is discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 343: Symposium H – Polycrystalline Thin Films - Structure, Texture, Properties and Applications , 1994 , 327
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

1. Lazzari, J.P., Melnick, I. and Randet, D., IEEE Trans. Magn. 3, 205 (1967).CrossRefGoogle Scholar
2. Lazzari, J.P., Melnick, I. and Randet, D., IEEE Trans. Magn. 5, 955 (1969).Google Scholar
3. Daval, J. and Randet, D., IEEE Trans. Magn. 6, 768 (1970).CrossRefGoogle Scholar
4. Chen, G.-L., IEEE Trans. Magn. 22, 334 (1986).Google Scholar
5. Fisher, R.D., Allen, J.C. and Pressesky, J.L., IEEE Trans. Magn. 22, 352 (1986).Google Scholar
6. Duan, S.L., Artman, J.O., Lee, J.-W., Wong, B. and Laughlin, D.E., IEEE Trans. Magn. 25, 3884 (1989).Google Scholar
7. Movchan, B.C. and Demchishin, C.B., Phys. Met. Metallogr. 28, 83 (1963).Google Scholar
8. Thorton, J.A., J. Vac. Sci. Technol. 11, 666 (1974).Google Scholar
9. Lee, H.J., J. Appl. Phys. 57, 4037 (1985).Google Scholar
10. Ohno, T., Shiroishi, Y., Hishiyama, S., Suzuki, H. and Matsuda, Y., IEEE Trans. Magn. 23, 2809 (1987).CrossRefGoogle Scholar
11. Ravipati, D.P., Haines, W.G., and Dockendorf, J.L., J. Vac. Sci.Technol. A5, 1968 (1987).Google Scholar
12. Mattox, D.M., J. Vac. Sci. Tecnol., A7 (3), 1105 (1989).Google Scholar
13. Duan, S.L., Artman, J.O., Wong, B., and Laughlin, D.E., J. Appl. Phys. 67, 4913 (1990).Google Scholar
14. Pressesky, J., Lee, S.Y., Duan, S.L. and Williams, D., J. Appl. Phys. 69, 5163 (1991).Google Scholar
15. Yogi, T., Nguyen, T.A., Lambert, S.E., Gorman, G.L. and Castillo, G., Mat. Sci. Soc. Symp. Proc. 232, 3 (1991).Google Scholar
16. Lin, J., Wu, C. and Silvertsen, J.M., IEEE Trans. Magn. 26, 39 (1990).Google Scholar
17. Hono, K., Wong, B. and Laughlin, D.E., J. Appl. Phys. 68, 4734 (1990).Google Scholar
18. Tang, Li and Thomas, Gareth, J. Appl. Phys. 74, 5025 (1993).Google Scholar
19. Winterbottom, W. L., Acta Metallurgica 15, 303 (1967).Google Scholar
20. Cahn, J. W. and Taylor, J., Phase Transformations 87, 545 (1988).Google Scholar
21. Feng, Y. C., Laughlin, D. E. and Lambeth, D. N., (unpublished)Google Scholar
22. Lee, L.-L., Laughlin, D.E. and Lambeth, D.N. (unpublished).Google Scholar
23. Hsu, Y., Chen, Q., Johnson, K.E., Suvertson, J.M. and Judy, J.H., Proceedings of the Second International Symposium on Magnetic Materials, Processes, and Devices of the Electrochemical Society, 92–10, 95 (1991).Google Scholar
24. Nakamura, A. and Futamoto, M., Jpn. J. Appl. Phys. 32, Pt.2, L1410 (1993).Google Scholar
25. Hikosaka, T. and Nishikawa, R., IEEE Trans. Magn. in Japan, 67, 678 (1991).Google Scholar
26. Yogi, T., Gorman, G. L., Hwang, C., Kakalec, M. A. and Lambert, S. E., IEEE Trans. Magn. 24, 2727 (1988).Google Scholar
27. Laughlin, David E. and Wong, Bunsen Y., IEEE Trans. Magn. 27, 4713 (1991).Google Scholar
28. Wong, B.Y. and Laughlin, D.E., Appl. Phys. Lett. 61, 2533 (1992).Google Scholar
29. Feng, Y. C., Laughlin, D. E. and Lambeth, D. N., submitted 6th MMM-INTERMAG.Google Scholar