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Epitaxial Batio3 and Knbo3 Thin Films On Various Substrates for Optical Waveguide Applications

Published online by Cambridge University Press:  10 February 2011

L. Beckers
Affiliation:
Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich, D-52425 Jülich, Germany, [email protected]
W. Zander
Affiliation:
Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich, D-52425 Jülich, Germany, [email protected]
J. Schubert
Affiliation:
Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich, D-52425 Jülich, Germany, [email protected]
P. Leinenbach
Affiliation:
Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich, D-52425 Jülich, Germany, [email protected]
Ch. Buchal
Affiliation:
Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich, D-52425 Jülich, Germany, [email protected]
D. Fluck
Affiliation:
Nonlinear Optics Laboratory, Institute of Quantum Electronics, ETH Hönggerberg, CH-8093 Zürich, Switzerland
P. Gügnter
Affiliation:
Nonlinear Optics Laboratory, Institute of Quantum Electronics, ETH Hönggerberg, CH-8093 Zürich, Switzerland
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Abstract

Technologically interesting optical materials such as BaTiO3 and KnbO3 are difficult to grow as single crystals of large dimensions. Thin film techniques can overcome this problem by synthesizing these materials on commercially available substrates. We demonstrate the deposition of single crystalline BaTiO3 and KnbO3 on MgO, SrTiO3 and buffered MgO substrates by Pulsed Laser Deposition (PLD). The samples are characterized by Rutherford Backscattering Spectrometry / Channeling (RBS/C), X-Ray Diffraction (XRD) and Atomic Force Microscopy (AFM). We found excellent crystalline quality, confirmed by RBS/C minimum yield values of 2 % and a FWHM of 0.36° of the BaTiO3(002) rocking curve. Even films of a few microns thickness have been grown without loss of crystalline perfection, and all films show very flat surfaces. The RMS roughness of a 950 nm BaTiO3 film was found to be 1.1 nm.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

1. Harada, J., in: Landolt-Bömstein, “Ferroelektrika und verwandte Substanzen”, The New Series 11116 a (Springer-Verlag, Berlin, 1981) p. 66 ff.Google Scholar
2. Walker, F.J., McKee, R.A., Yen, H.-W., Zelmon, D.E., Appl. Phys. Lett. 65 (1994) 1495.Google Scholar
3. Srikant, V., Tarsa, E.J., Clarke, D.R., Speck, J.S, J. Appl. Phys. 77 (1995) 1517.Google Scholar
4. Stritzker, B., Schubert, J., Poppe, U., Zander, W., Krüger, U., Lubig, A., Buchal, Ch., Journal of Less-Common Metals 164&165 (1990) 279.Google Scholar
5. Manufactured by Dr. Rytz, D., FEE GmbH, D-55743 Idar-Oberstein, Germany.Google Scholar
6. Fork, D.K., Armani-Leplingard, F., Kingston, J.J., Mat. Res. Soc. Symp. 361 (1994) 155.Google Scholar
7. Thöny, S Schwyn, Lehmann, H.W., Günter, P., Appl. Phys. Lett. 61 (1992) 373.Google Scholar