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Electroluminescence as a Function of Electric Field and Temperature in Amorphous Silicon-Carbon Based p-i-n Structures

Published online by Cambridge University Press:  28 February 2011

A. B. Pevtsov
Affiliation:
Ioffe Physical-Technical Institute, St. Petersburg, Russia
A. G. Pilatov
Affiliation:
Ioffe Physical-Technical Institute, St. Petersburg, Russia
N. A. Feoktistov
Affiliation:
Ioffe Physical-Technical Institute, St. Petersburg, Russia
A. V. Zherzdev
Affiliation:
Ioffe Physical-Technical Institute, St. Petersburg, Russia
S. M. Karabanov
Affiliation:
Ioffe Physical-Technical Institute, St. Petersburg, Russia
T. Muschik
Affiliation:
Technical University of Munich, Physics Department E16, W-8046 Garching, Germany.
D. Zrenner
Affiliation:
Ioffe Physical-Technical Institute, St. Petersburg, Russia
R. Schwarz
Affiliation:
Technical University of Munich, Physics Department E16, W-8046 Garching, Germany.
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Abstract

Electroluminescence at room temperature with a peak energy between 1.6 and 1.8 eV is observed in a-SiC:H p-i-n devices containing thin injection layers of high bandgap a-SiC:H. The temperature dependence of electroluminescence between 80 K and 320 K is much weaker than expected from the photoluminescence signal. No shift of the electroluminescence spectrum is observed up to voltages of 20 V applied across a 110 nm thick device. The results are compared to well-known features of electroluminescence in a-Si:H devices.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

[1] Kruangam, D., Endo, T., Deguchi, M., Guang-Pu, W., Okamoto, H., and Hamakawa, Y., Optoelectronics - Devices and Technologies 1 (1986) 67.Google Scholar
[2] Hamakawa, Y., Kruangam, D., Toyama, T., Yoshimi, M., Paasche, S., and Okamoto, H., Optoelectronics - Devices and Technologies 4 (1989) 281.Google Scholar
[3] Paasche, S.M., Toyama, T., Okamoto, H., and Hamakawa, Y., IEEE Trans. Electr. Dev. 36 (1989) 2895.Google Scholar
[4] Carius, R., Mat. Res. Soc. Symp. Proc. 192 (1990) 101.Google Scholar
[5] Wang, K., Han, D., Zvanut, M.E., and Silver, M., Phil. Mag. B63 (1991) 175.Google Scholar
[6] Alvarez, F., Fragnito, H.L., and Chambouleyron, I., J. Appl. Phys. 63 (1988) 244.Google Scholar
[7] Yoshimi, M., Shimizu, H., Hattori, K., Okamoto, H., and Hamakawa, Y., Optoelectronics - Devices and Technologies 7 (1992) 69.Google Scholar
[8] Zherzdev, A.V., Karpov, V.G., and Pevtsov, A.B., Sov. Phys. Semicond. 26 (1992) 167, (in Russian).Google Scholar
[9] Sze, S.M., Physics of Semiconductor Devices, (Wiley-Interscience, New York, 1969).Google Scholar
[10] Volkov, A.S. et al., J. of Non-Cryst. Solids 114 (1989) 407.Google Scholar
[11] Liedtke, S. et al., J. of Non-Cryst. Solids 114 (1989) 522.Google Scholar
[12] O'Reilly, E.P., J. of Non-Cryst. Solids 97 & 98 (1987) 1095.Google Scholar
[13] Robertson, J., Adv. Phys. 35 (1986) 317.Google Scholar
[14] Monroe, D., Phys. Rev. Lett. 54 (1985) 145.Google Scholar