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DC-Magnetron Sputtered Silicon Carbide

Published online by Cambridge University Press:  21 February 2011

M. Tenhover  and
I. B. Ruppel
M. Tenhover
Affiliation:
The Carborundum Company, Niagara Falls, New York, 14302 Technology Division, Bldg. 100
I. B. Ruppel
Affiliation:
The Carborundum Company, Niagara Falls, New York, 14302 Advanced Ceramics Division, Bldg. 89
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Abstract

The preparation and properties of relatively thick films of DC magnetron sputtered SiC films is described. The films were prepared using a new ceramic sputter target material. The new target material is called Hexoloy® SG–90. It is an electrically conductive, dense ceramic material which can be used as a sputter target to yield insulating amorphous SiC thin films on room temperature substrates.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 356: Symposium B2 – Thin Films: Stresses and Mechanical Properties V , 1994 , 227
Copyright
Copyright © Materials Research Society 1995

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