Hostname: page-component-586b7cd67f-t7czq Total loading time: 0 Render date: 2024-11-25T17:42:25.192Z Has data issue: false hasContentIssue false

Control of and Mechanisms for Room Temperature Visible light Emission from Silicon Nanostructures in SiO2 formed by Si+ Ion Implantation

Published online by Cambridge University Press:  28 February 2011

T. Komoda
Affiliation:
Matsushita Electric Works, Ltd, UK R&D Laboratory The Surrey Research Park, Guildford, Surrey, GU2 5YG, UK
J.P. Kelly
Affiliation:
Department of Electronic and Electrical Engineering, University of Surrey, Guildford, Surrey, GU2 5XH, UK
A. Nejm
Affiliation:
Department of Electronic and Electrical Engineering, University of Surrey, Guildford, Surrey, GU2 5XH, UK
K.P. Homewood
Affiliation:
Department of Electronic and Electrical Engineering, University of Surrey, Guildford, Surrey, GU2 5XH, UK
P.L.F Hemment
Affiliation:
Department of Electronic and Electrical Engineering, University of Surrey, Guildford, Surrey, GU2 5XH, UK
B.J. Sealy
Affiliation:
Department of Electronic and Electrical Engineering, University of Surrey, Guildford, Surrey, GU2 5XH, UK
Get access

Abstract

Implantation of Si+ ions into thermal oxides grown on silicon has been used to synthesise a two phase structure consisting of Si nanocrystals in a SiO2 matrix. Various processing conditions have been used in order to modify the size and population distributions of the Si inclusions. Photoluminescence spectra have been recorded from samples annealed in nitrogen, forming gas and oxygen. Both red and blue shifts of the luminescence peaks have been observed. It is concluded that the photoluminescence is a consequence of the effects of quantum confinement but is also dependent on the presence of irradiation-induced defects or Si/SiO2 interface states.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Canham, L.T., Appl Phys Lett, 57, 1046 (1990).Google Scholar
2 Papers included in Mater Res Soc Symp Proc, 256 (1992); 283 (1993); 298 (1993).Google Scholar
3 Petrova-Koch, V. et al. , Appl Phys Lett, 61, 943 (1992).Google Scholar
4 Friedman, S.L. et al. , Appl Phys Lett, 62, 1934 (1993).Google Scholar
5 Takagahara, T. and Takeda, K, Phys Rev B, 46 (23), 15578 (1992).Google Scholar
6 Delley, B. and Steigmeier, E.F., Phys Rev B, 47 (3), 1397 (1993).Google Scholar
7 Schuppler, S., Friedman, S.L, Marcus, M.A., Adler, D.L., Xie, Y.-H., Ross, F.M., Harris, T.D., Brown, W.L., Chabal, Y.J., Brus, L.E. and Citrin, P.H, Phys Rev Lett, 72 (16), 2648 (1994).Google Scholar
8 Atwater, H.A., Shcheglov, K.V., Wang, S.S., Vahala, K.J., Flagan, R.C., Brongersma, M.L. and Polman, A., Mat Res Soc Symp Proc, 316, 409420 (1994).Google Scholar
9 Shimizu-Iwayama, T., Ohshima, M., Niimi, T., Nakao, S., Saitoh, K., Fujita, T. and Itoh, N., J Phys Condens Matter, 5, L375L380 (1993).Google Scholar
10 Shimizu-Iwayama, T., Fujita, K., Akai, M., Nakao, S. and Saitoh, K., (E-MRS Symp Proc, Strasbourg, France, 1994).Google Scholar
11 Komoda, T., Kelly, J.P., Cristiano, F., Nejim, A., Hemment, P.L.F., Homewood, K.P., Gwilliam, R.M., Mynard, J.E. and Sealy, B.J., (IIT '94 Proc, Catania, Italy, 1994) (to be published in Nucl Inst & Meths).Google Scholar
12 Milewski, P.D., Lichlenwalner, D.J., Mehta, P.,, Kengon, A.I., Zhang, D. and Kolbas, R.M., J Electron Mater, 23 (1), 57 (1994).Google Scholar
13 Mantl, S., Material Science Report, 8, 195 (1992).Google Scholar