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Comparative study of HVPE- and MOCVD-grown nitride structures for UV lasing application

Published online by Cambridge University Press:  17 March 2011

J. B. Lam
Affiliation:
Center for Laser and Photonics Research and Department of Physics, Oklahoma State University, Stillwater, OK 74078, USA
G. H. Gainer
Affiliation:
Center for Laser and Photonics Research and Department of Physics, Oklahoma State University, Stillwater, OK 74078, USA
S. Bidnyk
Affiliation:
Zenastra Photonics, Inc., Ottawa, ON K1G 4J8, Canada
Amal Elgawadi
Affiliation:
Center for Laser and Photonics Research and Department of Physics, Oklahoma State University, Stillwater, OK 74078, USA
G. H. Park
Affiliation:
Center for Laser and Photonics Research and Department of Physics, Oklahoma State University, Stillwater, OK 74078, USA
J. Krasinski
Affiliation:
Center for Laser and Photonics Research and Department of Physics, Oklahoma State University, Stillwater, OK 74078, USA
J. J. Song
Affiliation:
Center for Laser and Photonics Research and Department of Physics, Oklahoma State University, Stillwater, OK 74078, USA
D. V. Tsvetkov
Affiliation:
Technologies and Devices International, Inc., Gaithersburg, MD 20877, USA
V. A. Dmitriev
Affiliation:
Technologies and Devices International, Inc., Gaithersburg, MD 20877, USA
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Abstract

We studied and compared the emission properties of optically excited (Al)GaN structures grown by two different techniques: hydride vapor phase epitaxy (HVPE) and metalorganic chemical vapor deposition (MOCVD). We successfully achieved stimulated emission (SE) in an HVPE-grown GaN epilayer and a GaN/AlGaN double heterostructure at 10 K and room temperature. We found that the SE threshold and photoluminescence efficiency of the HVPE-grown samples are similar to those of high-quality MOCVD-grown structures. Photoluminescence measurements from 10 to 300 K show that the HVPE GaN has a high density of non-radiative recombination channels, especially those activated below 100 K. This study represents the first demonstration of SE in HVPE-grown (Al)GaN heterostructures.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

1. website, Nichia, “www.nichia.com.”Google Scholar
2. Bidnyk, S., Lam, J. B., Little, B. D., Kwon, Y. H., and Song, J. J., Appl. Phys. Lett. 75, 3905 (1999).Google Scholar
3. Akasaki, I., Sota, S., Sakai, H., Tanaka, T., Koike, M., and Amano, H., Electron. Lett. 32, 1105 (1996).Google Scholar
4. Usui, A., Sunakawa, H., Sakai, A., and Yamaguchi, A. A., Jpn. J. Appl. Phys. Part 2, 36, L899 (1997).Google Scholar
5. Skromme, B. J., Jayapalan, J., Vaudo, R. P., and Phanse, V. M., Appl. Phys. Lett. 74, 2358 (1999).Google Scholar
6. Kelly, M. K., Vaudo, R. P., Phanse, V. M., Gorgens, L., Ambacher, O. and Stutzmann, M., Jpn. J. Appl. Phys. Part 2, 38, L217 (1999).Google Scholar
7. Nakamura, S., Senoh, M., Nagahama, S. I., Iwasa, N., Yamada, T., Matsushita, T., Kiyoku, H., Sugimoto, Y., Kozaki, T., Umemoto, H., Sano, M., and Chocho, K., Appl. Phys. Lett. 73, 832 (1998).Google Scholar
8. Kuramoto, M., Sasaoka, C., Hisanaga, Y., Kimura, A., Yamaguchi, A. A., Sunakawa, H., Kuroda, N., Nido, M., Usui, A., and Mizuta, M., Japn. J. Appl. Phys. 38, L184 (1999).Google Scholar
9. Shan, W., Schmidt, T. J., Hauenstein, R. J., and Song, J. J., Appl. Phys. Lett. 66, 3492 (1995).Google Scholar
10. Hearne, S., Chason, E., Han, J., Floro, J. A., Figiel, J., Hunter, J., Amano, H., Tsong, I. S. T., Appl. Phys. Lett. 74, 356 (1999).Google Scholar
11. Bidnyk, S., Schmidt, T. J., Little, B. D. and Song, J. J., Appl. Phys. Lett. 74, 1 (1999).Google Scholar
12. Gotz, W., Romano, L. T., Walker, J., Johnson, N. M., and Molnar, R. J., Appl. Phys. Lett. 72, 1214 (1998).Google Scholar