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The Chemisorption of Fluorine on Silicon (111) Surfaces
Published online by Cambridge University Press: 22 February 2011
Abstract
High-resolution, soft x-ray photoemission investigations of fluorine chemisorption on silicon (111) surfaces are reported. The distribution of fluorosilyl moieties was found to be strongly dependent upon the surface structure. The 2×1 reconstruction exhibited only monofluoro species, while the 7×7 showed a distribution of mono-, di-, and trifluorosilyl groups.
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- Copyright © Materials Research Society 1984
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