No CrossRef data available.
Article contents
Characterization of Zinc Oxide Thin Films Deposited by rf Magnetron Sputtering on Mylar Substrates
Published online by Cambridge University Press: 21 March 2011
Abstract
Aluminium doped zinc oxide thin films (ZnO:Al) have been deposited on polyester (Mylar type D, 100 µm thickness) substrates at room temperature by r.f. magnetron sputtering. The structural, morphological, optical and electrical properties of the deposited films have been studied. The samples are polycrystalline with a hexagonal wurtzite structure and a strong crystallographic c-axis orientation (002) perpendicular to the substrate surface. The ZnO:Al thin films with 85% transmittance in the visible and infra-red region and a resistivity as low as 3.6×10−2 ωcm have been obtained, as deposited. The obtained results are comparable to those ones obtained on glass substrates, opening a new field of low cost, light weight, small volume, flexible and unbreakable large area optoelectronic devices.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 2001