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Published online by Cambridge University Press: 21 March 2011
Photo luminescence (PL) signal from the aluminum nitride (AlN) films, excited by near UV (363.8 nm) laser has been measured at the room temperature. The AlN films are deposited by radio frequency (RF) sputtering of aluminum in argon-nitrogen-hydrogen gas mixture. Positions of the PL peaks maximums are influenced by the AlN preparation regimes. The analysis of the PL data is based on the results of the structural studies and electron spectrum investigations.