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Aerosol-Assisted Chemical Vapor Deposition (AACVD) of Binary Alloy Films: Studies of Film Composition

Published online by Cambridge University Press:  15 February 2011

Chongying Xu ,
Mark J. Hampden-Smith  and
Toivo T. Kodas
Chongying Xu
Affiliation:
Department of Chemistry, University of New Mexico, Albuquerque, NM 87131
Mark J. Hampden-Smith
Affiliation:
Department of Chemistry, University of New Mexico, Albuquerque, NM 87131
Toivo T. Kodas
Affiliation:
Department of Chemical Engineering, University of New Mexico, Albuquerque, NM 87131
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Abstract

The chemical vapor deposition (CVD) of Cu-Ag and Cu-Pd alloys using aerosol precursor delivery over a range of preheating temperatures, 70∼80 °C and substrate temperatures, 250∼300 °C is described. The precursors used include Cu(hfac)2, (hfac)Ag(Set2) and Pd(hfac)2 dissolved in toluene and 10% H2 in Ar as carrier gas. The films were characterized by SEM, EDS and X-ray diffraction (XRD). The X-ray diffraction results showed the Cu/Ag films were composed of α-and β-phases of Cu-Ag alloys, the Cu/Pd films were Cu-Pd alloy, solid solutions, under these conditions. Compositional variation studies in Cu-Pd and Pd-Ag alloy systems were also conducted by mixing Cu(hfac)2/Pd(hfac)2 and (hfac)Ag(SEt2)/Pd(hfac)2 in toluene solution in different ratios. The films were characterized by X-ray diffraction and the results showed the composition of films was affected by the solution stoichiometry.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 363 , 1994 , 263
Copyright
Copyright © Materials Research Society 1995

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