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Adsorption-Induced Failure Modes of Thin-Film Resonators

Published online by Cambridge University Press:  21 March 2011

R. Kazinczi ,
J.R. Mollinger  and
A. Bossche
R. Kazinczi
Affiliation:
Delft University of Technology, DIMES Mekelweg 4, 2628 CD Delft, The Netherlands E-mail: [email protected]
J.R. Mollinger
Affiliation:
Delft University of Technology, DIMES Mekelweg 4, 2628 CD Delft, The Netherlands E-mail: [email protected]
A. Bossche
Affiliation:
Delft University of Technology, DIMES Mekelweg 4, 2628 CD Delft, The Netherlands E-mail: [email protected]
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Abstract

The mechanical and resonant properties of thin film resonators are influenced by the surrounding environment. Adsorption- and surface oxidation-induced stiffening effect was observed on silicon nitride and silicon carbide cantilever beams. The resonance frequency increased logarithmically in time upon exposure to ambient air. The variations of surface stress and spring constant of the SiNx cantilever beam were calculated. Further oxynitride formation on the surface increased the stability of the resonators. The shock response of the structures was studied in various environments. The resonance frequency abruptly dropped due to cracking of the absorbed surface layer, than recovered logarithmically. The initial drop and the recovery rate is environment dependant. Humidity increased, while argon and nitrogen rich environments mitigated the degrading effects. The SiCx is more inert to the environmental effects and proved to be a promising candidate as structural material in resonant MEMS devices.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 695: Symposium L – Thin Films: Stresses and Mechanical Properties IX , 2001 , L8.8.1
Copyright
Copyright © Materials Research Society 2002

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References

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