Hostname: page-component-78c5997874-v9fdk Total loading time: 0 Render date: 2024-11-04T17:35:28.481Z Has data issue: false hasContentIssue false

Uniformity and Performance Characterization of GaN P-I-N Photodetectors Fabricated From 3-Inch Epitaxy

Published online by Cambridge University Press:  15 February 2011

R. Hickman II
Affiliation:
SVT Associates, Inc., 7620 Executive Dr., Eden Prairie, MN 55344, [email protected]
J. J. Klaassen
Affiliation:
SVT Associates, Inc., 7620 Executive Dr., Eden Prairie, MN 55344, [email protected]
J. M. Van Hove
Affiliation:
SVT Associates, Inc., 7620 Executive Dr., Eden Prairie, MN 55344, [email protected]
A. M. Wowchak
Affiliation:
SVT Associates, Inc., 7620 Executive Dr., Eden Prairie, MN 55344, [email protected]
C. Polley
Affiliation:
SVT Associates, Inc., 7620 Executive Dr., Eden Prairie, MN 55344, [email protected]
M. F. Rosamond
Affiliation:
SVT Associates, Inc., 7620 Executive Dr., Eden Prairie, MN 55344, [email protected]
P. P. Chow
Affiliation:
SVT Associates, Inc., 7620 Executive Dr., Eden Prairie, MN 55344, [email protected]
Get access

Abstract

Gallium nitride wafer epitaxy on large diameter substrates is critical for the future fabrication of large area UV linear or 2D imaging arrays, as well as for the economical production of other GaN-based devices. Typical group III-nitride deposition is now performed on 2-inch diameter or smaller sapphire substrates. Reported here are visible blind, UV GaN p-in photodetectors which have been fabricated on 3-inch diameter (0001) sapphire substrates by RF atomic nitrogen plasma MBE. The uniformity across the wafer of spectral responsivity and shunt resistance (R0) for the p-i-n photodetectors has been characterized. Spectral responsivity and 1/f noise as a function of temperature exceeding 250°C will be presented for the GaN p-i-n photodetectors. Spectral response with >0.17 A/W at peak wavelength and having 4-6 orders of magnitude visible rejection has been achieved. 1/f noise typically less than 10-14 A/Hz1/2 at room temperature also has been achieved with GaN p-i-n photodiodes. The results have been correlated with proposed models for dark current and 1/f noise in GaN diodes.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Xu, G., Salvador, A., Botchkarev, A. E., Kim, W., Lu, C., Tang, H., Morkoc, H., Smith, G., Estes, M., Dang, T., and Wolf, P. in Materials Science Forum, Part 2 (264–268, Trans Tech, Enfield, NH, 1998) pp. 14411444.Google Scholar
2. Kuksenkov, D. V., Temkin, H., Osinsky, A., Gaska, R., and Khan, M. A., in 1997 International Electron Devices Meeting Technical Digest (EEE, Piscataway, NJ, 1997) pp. 759762.Google Scholar
3. Osinsky, A., Gangopadhyay, S., Gaska, R., Williams, B., and Khan, M. A., Appl. Phys. Lett. 71 (16), 2334 (1997).Google Scholar
4. Hove, J. M. Van, Cosimini, G. J., Nelson, E., Wowchak, A. M., and Chow, P. P., J. Cryst. Growth 150, 908 (1995).Google Scholar
5. Hove, J. M. Van, Chow, P. P., Hickman, R., Wowchak, A. M., Klaassen, J. J., and Polley, C. J. in III-V Nitrides, edited by Ponce, F. A., Moustakas, T. D., Akasaki, I., and Monemar, B. A. (Mater. Res. Soc. Proc. 449, Pittsburgh, PA, 1996) pp. 12271231.Google Scholar
6. Hove, J. M. Van, Hickman, R., Klaassen, J. J., and Chow, P. P., Appl. Phys. Lett. 70 (17), 2282 (1997).Google Scholar