A submicron conductor array was fabricated without using lithography by selectively etching a recrystallized A1-A12Cu eutectic alloy thin film. The 2 micron thick eutectic films were deposited on glass substrates and directionally solidified with both a quartz-iodine lamp and a scanning laser at rates between .0016 and .14 cm/sec. The resulting structure consisted of alternate parallel stripes of the two eutectic phases with a spacing between .5 and 4 microns that was controlled by the solidification rate. An array of submicron Al- rich conductors was fabricated by selectively etching away the Al2 Cu phase. At solidification rates greater than .004 cm/sec using the lamp heater the solid-liquid interface became non-planar while with the laser the structure was well alligned at the highest rates used, .14 cm/sec. At the maximum theoretical solidification rate that produces a two phase aligned eutectic structure the width of the Al wires would be 100A.