Hostname: page-component-78c5997874-8bhkd Total loading time: 0 Render date: 2024-11-19T13:11:03.872Z Has data issue: false hasContentIssue false
  • English
  • Français

Spatially-Resolved Emission Profiles of Parallel Plate RF Glow Discharges

Published online by Cambridge University Press:  25 February 2011

Richard M. Roth
Richard M. Roth*
Affiliation:
Amoco Corporation, Corporate Research, P.O. Box 400, Naperville, IL 60566
Get access

Abstract

An apparatus is described which can acquire, in less than a second, a spectrally-resolved, spatial profile of the light emitted from a parallel plate, rf glow discharge. This is achieved by imaging the discharge emission onto the entrance slit of a monochromator with its spatial integrity preserved. Then a spatially-resolved image is detected by an optical multichannel detector which is oriented parallel to the entrance slit. Spatial profiles from nonreactive gas discharges demonstrate that the symmetry of an rf discharge can be dramatically affected by the nature of the gas.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 98: Symposium K – Plasma Processing and Synthesis of Materials II , 1987 , 209
Copyright
Copyright © Materials Research Society 1987

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Wagner, J., Wild, Ch., Pohl, F., and Koidl, P., Appl. Phys. Lett. 48, 106 (1986).Google Scholar
2. Rosny, G. de, Mosburg, E. R., Abelson, J. R., Devaud, G., and Kerns, R. C., J. Appl. Phys. 54, 2272 (1983).Google Scholar
3. Gottscho, R. A. and Donnelly, V. M., J. Appl. Phys. 56, 245 (1984).Google Scholar
4. Flamm, D. L. and Donnelly, V. M., J. Appl. Phys. 59, 1052 (1986).Google Scholar
5. Matsuda, A., Nakagawa, K., Tanaka, K., Matsumura, M., and Yamasaki, S., J. Non-Cryst. Solids 35&36, 183 (1980).Google Scholar
6. Gottscho, R. A., Davis, C. P., and Burton, R. H., Plasma Chem. Plasma Proc. 3, 193 (1983).Google Scholar
7. Barnes, R. M. and Winslow, R. J., J. Phys. Chem. 82, 1869 (1978).Google Scholar
8. Bletzinger, P. and DeJoseph, C. A., IEEE Trans. PS14, 124 (1986).Google Scholar
9. Roth, R. M., Spears, K. G., and Wong, G., AppI. Phys. Lett. 54, 28 (1984).Google Scholar
10. Horwitz, C. M., J. Vac. Sci. Technol. A 1, 60 (1983).Google Scholar
11. Kohler, K., Coburn, J. W., Horne, D. E., Kay, E., and Keller, J. H., J. Appl. Phys. 57, 59 (1985).Google Scholar