Hostname: page-component-586b7cd67f-l7hp2 Total loading time: 0 Render date: 2024-11-25T17:39:18.538Z Has data issue: false hasContentIssue false

The Role of Single and Multi-Electron Excitations in Electron Stimulated Desorption

Published online by Cambridge University Press:  28 February 2011

P H. Avouris
Affiliation:
IBM T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598
F. Bozso
Affiliation:
IBM T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598
A. R. Rossi
Affiliation:
IBM T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598
Get access

Abstract

We investigate the nature of the electronic transitions which lead to the desorption of ions from adsorbate-covered metal and semiconductor surfaces. F+ desorption from F/Si occurs via a Knotek-Feibelman mechanism, while H+ desorption from H/Si and O+ from CO/metals involve multi-electron transitions. The desorption of CO+ from CO/metals and NO+ from NO/Si apparently occurs via a simple Menzel-Gomer-Redhead mechanism.

Type
Articles
Copyright
Copyright © Materials Research Society 1987

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. For recent reviews see: Knotek, M. L., Rept. Progr. Phys. 47, 1499 (1984); T. E. Madey, D. E. Ramaker and R. Stockbauer, Ann. Rev. Phys. Chem. 35, 215 (1984); D. Menzel, Nucl. Instr. Meth. B 13, 507 (1986); Ph. Avouris, F. Bozso and R. E. Walkup, Nucl. Instr. Meth. B, (1987) (to be published).CrossRefGoogle Scholar
2. Menzel, D. and Gomer, R., J. Chem. Phys. 41, 3311 (1964).Google Scholar
3. Redhead, P., Can. J. Phys. 42, 886 (1964).Google Scholar
4. Knotek, M. L. and Feibelman, P. J., Phys. Rev. Lett. 40, 964 (1978).CrossRefGoogle Scholar
5. Franchy, R. and Menzel, D., Phys. Rev. Lett. 43, 865 (1979); D. E. Ramaker, J. Chem. Phys. 78, 2998 (1983); D. R. Jennison, J. Vac. Sci. Technol. 20, 548 (1982).Google Scholar
6. de Moraes, M. and Lichtman, D., J. Vac. Sci. Technol. A 2, 1595 (1984); Ch. Park, M. Kramer and E. Bauer, Surf. Sci. L533 (1981).Google Scholar
7. Knotek, M. L. and Houston, J. E., J. Vac. Sci. Technol. 20, 544 (1982); V. M. Bermudez, T. M. Parrill and R. Kaplan, Surf. Sci. 173, 234 (1986); M. J. Bozack, M. J. Dresser, W. J. Choyke and J. T. Yates, to be published.CrossRefGoogle Scholar
8. Ph. Avouris, Rossi, A. R. and Bozso, F., (to be published).Google Scholar
9. Chen, M. and Batra, I. P., J. Vac. Sci. Technol. 16, 570 (1979).Google Scholar
10. Agrawal, B. K. and Agrawal, S., Phys. Rev. B 29, 6870 (1984).Google Scholar
11. Matthew, J. A. D. and Komninos, Y., Surf. Sci. 53, 716 (1975).Google Scholar
12. Bozso, F. and Avouris, Ph., Phys. Rev. Lett. 57, 1185 (1986).Google Scholar
13. Appelbaum, J. A. and Hamann, D. R., Phys. Rev. Lett. 34, 806 (1975).Google Scholar
14. Madden, H. H., Jennison, D. R., Traum, M. M., Margaritondo, G. and Stoffel, N. G., Phys. Rev. B 26, 896 (1982).Google Scholar
15. Bozso, F. and Avouris, Ph., Chem. Phys. Lett. 125, 531 (1986).Google Scholar
16. Treichler, R., Reidel, W., Wurth, W., Feulner, P. and Menzel, D., Phys. Rev. Lett. 54, 462 (1985).Google Scholar
17. Avouris, Ph., Bozso, F. and Walkup, R. E., Nucl. Instr. Meth. Phys. Res. B, (to be published).Google Scholar
18. Madey, T. E. and Yates, J. T. Jr., J. Vac. Sci. Technol. 8, 525 (1971) and references cited therein.Google Scholar
19. Avouris, Ph., Bagus, P. S., Nelin, C. J. and Rossi, A. R., J. Vac. Sci. Technol. A, (to be published).Google Scholar