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Real-Time Kinetic Analysis of Hydrogen Abstraction and Etching Reactions Using Pulsed-Gas PECVD of Amorphous and Microcrystalline Silicon
Published online by Cambridge University Press: 15 February 2011
Abstract
Hydrogen elimination reactions, abstraction and etching, are monitored in real-time using a differentially pumped mass spectrometer, while intermittently exposing a hydrogenated silicon surface to atomic deuterium. The mass spectrometer signals are used to predict the kinetics of the abstraction reaction, and to qualitatively treat the etch reaction.
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- Copyright © Materials Research Society 1997
References
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