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Progress in the Preparation of Aluminum Nitride Substrates from Bulk Crystals

Published online by Cambridge University Press:  01 February 2011

J.C. Rojo
Affiliation:
Crystal IS, Inc., Latham, NY 12110
L.J. Schowalter
Affiliation:
Crystal IS, Inc., Latham, NY 12110 Rensselaer Polytechnic Institute, Troy, NY 12180
Glen Slack
Affiliation:
Crystal IS, Inc., Latham, NY 12110 Rensselaer Polytechnic Institute, Troy, NY 12180
K. Morgan
Affiliation:
Crystal IS, Inc., Latham, NY 12110
J. Barani
Affiliation:
Crystal IS, Inc., Latham, NY 12110
S. Schujman
Affiliation:
Rensselaer Polytechnic Institute, Troy, NY 12180
S. Biswas
Affiliation:
Rensselaer Polytechnic Institute, Troy, NY 12180
B. Raghothamachar
Affiliation:
SUNY, Stony Brook, NY 11794
M. Dudley
Affiliation:
SUNY, Stony Brook, NY 11794
M. Shur
Affiliation:
Rensselaer Polytechnic Institute, Troy, NY 12180 Sensor Electronic Technology, Inc., Latham, NY 12110
R. Gaska
Affiliation:
Rensselaer Polytechnic Institute, Troy, NY 12180 Sensor Electronic Technology, Inc., Latham, NY 12110
N.M. Johnson
Affiliation:
Palo Alto Research Center Inc. (PARC), Palo Alto, CA 94304
M. Kneissl
Affiliation:
Palo Alto Research Center Inc. (PARC), Palo Alto, CA 94304
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Abstract

Large (11-mm diameter) single-crystal AlN boules have been prepared using sublimationrecondensation growth. X-ray topography shows that substrates prepared from those boules have a dislocation density of less than 500 cm-2, while the central region of these substrates was nearly dislocation-free. Rocking curves of less than 10 arcsecs have been obtained indicating the high quality of these crystals. The AlN substrates have been used to growth an AlGaN/AlN multiquantum well structure with excellent crystalline quality and with photoluminescence peaked at around 260nm. In addition, a UV LED with emission wavelength at 360nm has been fabricated. This is the first operating opto-electronic device demonstrated on an AlN substrate.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

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References

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