Hostname: page-component-586b7cd67f-t7fkt Total loading time: 0 Render date: 2024-11-23T11:35:43.561Z Has data issue: false hasContentIssue false

Paramagnetic Defects and Photoluminescence in Carbon Rich a-SiC:H Films: Role of Hydrogen and Excess of Carbon

Published online by Cambridge University Press:  01 February 2011

A. V. Vasin
Affiliation:
[email protected], NASU, Lashkaryov Institute of Semiconductor Physics, Kiev 03028, N/A, Ukraine
A.A. Konchits
Affiliation:
[email protected], NASU, Laskharyov Institute of Semiconductor Physics, Kiev 03028, N/A, Ukraine
S.P. Kolesnik
Affiliation:
[email protected], NASU, Laskharyov Institute of Semiconductor Physics, Kiev 03028, N/A, Ukraine
A.V. Rusavsky
Affiliation:
[email protected], NASU, Laskharyov Institute of Semiconductor Physics, Kiev 03028, N/A, Ukraine
V.S. Lysenko
Affiliation:
[email protected], NASU, Laskharyov Institute of Semiconductor Physics, Kiev 03028, N/A, Ukraine
A.N. Nazarov
Affiliation:
[email protected], NASU, Laskharyov Institute of Semiconductor Physics, Kiev 03028, N/A, Ukraine
Y. Ishikawa
Affiliation:
[email protected], Japan Fine Ceramic Center, Atsuta-ku, Nagoya 456-858, N/A, Japan
S. Ashok
Affiliation:
[email protected], Penn State University, 212 EES Building, University Park, PA, 16802, United States
Get access

Abstract

The effect of excess of carbon in a-Si1−xCx:H has been studied with regard to local structure reconstruction, evolution of paramagnetic defects and photoluminescence (PL) after vacuum annealing over the temperature range 300–850°C. Two series of samples with stoichiometric (Si0.5C0.5) and carbon-rich (Si0.3C0.7) compositions were studied by Electron Paramagnetic Resonance (EPR), Photoluminescence (PL) and Raman scattering. It is found that there exist two effects responsible for the PL efficiency of a-Si1-xCx:H films: “killing” effect of carbon-related paramagnetic defects and “enhancing” effect of carbon-hydrogen bonds in Si:C-Hn configuration. A microstructure model is proposed for explaining the non-monotonic behavior of integrated PL intensity and concentration of paramagnetic centers and Si:C-Hn bonds as a function of annealing temperature. This model evolves from the following principal processes during thermal treatment of a-Si1−xCx:H: thermally activated release of weakly bonded hydrogen, migration of hydrogen within material and interaction of hydrogen with carbon-related defects.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Reitano, R., Baeri, A. and Foti, G., Philos. Mag. B 81, 629 (2001).Google Scholar
2. Vasin, A. V., Kolesnik, S. P., Konchits, A. A., Kushnirenko, V. I., Lysenko, V. S., Nazarov, A. N., Rusavsky, A. V., Ashok, S., J. Appl. Phys. 99, 113520 (2006).Google Scholar
3. Druz, B., Zaritsky, I., Yevtukhov, Y., Konchits, A., Valakh, M., Shanina, B., Kolesnik, S., Yanchuk, I., Yu., Gromovoy, Diam. Rel. Mater. 13, 1592 (2004).Google Scholar
4. Barklie, R.C., Collins, M., Silva, S.R.P., Phys. Rev. B 61, 3548 (2000).Google Scholar
5. A., Petrich M., K., Gleason K., A., Reimer J., Phys. Rev. B 36, 9722 (1987).Google Scholar