Hostname: page-component-586b7cd67f-l7hp2 Total loading time: 0 Render date: 2024-11-29T07:43:22.531Z Has data issue: false hasContentIssue false
  • English
  • Français

A Novel Range of Noble Metal Organometallic Fluorides for use in the Fabrication of Submicron Metal Features by E-Beam or UV Irradiation

Published online by Cambridge University Press:  10 February 2011

J. Thomson ,
A. H. Fzea ,
J. Lobban ,
P. McGivern ,
J. A. Cairns ,
A. G. Fitzgerald ,
G. J. Berry ,
M. R. Davidson  and
Y. C. Fan
J. Thomson*
Affiliation:
Department of Chemistry
A. H. Fzea
Affiliation:
Department of Chemistry
J. Lobban
Affiliation:
Department of Chemistry
P. McGivern
Affiliation:
Department of Chemistry
J. A. Cairns
Affiliation:
Department of Applied Physics and Electrical and Mechanical Engineering, University of Dundee, Dundee, DDI 4HN, Scotland, UK
A. G. Fitzgerald
Affiliation:
Department of Applied Physics and Electrical and Mechanical Engineering, University of Dundee, Dundee, DDI 4HN, Scotland, UK
G. J. Berry
Affiliation:
Department of Applied Physics and Electrical and Mechanical Engineering, University of Dundee, Dundee, DDI 4HN, Scotland, UK
M. R. Davidson
Affiliation:
Department of Applied Physics and Electrical and Mechanical Engineering, University of Dundee, Dundee, DDI 4HN, Scotland, UK
Y. C. Fan
Affiliation:
Department of Applied Physics and Electrical and Mechanical Engineering, University of Dundee, Dundee, DDI 4HN, Scotland, UK
*
* Correspondence author, e-mail [email protected]. uk
Get access

Summary

The preparation a nd characterisationo f a novel organoplatinum fluoride is described. The physical vapour deposition (PVD) of the material was performed in the temperature range 160–170°C, and electron beam bombardment or uv irradiation, results in the degradation of the compound to give high quality metal features down to dimensions of ca 60 nm.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 546: Symposium AA – Materials Science of Microelectromechanical Systems (MEMS)… , 1998 , 225
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Technical News Release, C-98048, Dallas, 26/8/98Google Scholar
2 Cairns, J.A. and Thomson, J. Eur. Pat. 0, 670, 055 (1997)Google Scholar
3 ‘Production of an X-Ray Photomask’, Cairns, J.A., Thomson, J., Fitzgerald, A.G., Berry, G.J., Rodley, D. and Davidson, M., Intemational Conference in Micro and Nanoengineering, Athens, Greece, Sept., 1997 Google Scholar
4 ‘1 nm X-Ray Lithography Using Novel Mask Fabrication Technique’, Berry, G.J., Cairns, J.A., Davidson, M.R., Rodley, D.R.G., Thomson, J., Turcu, I.C.E. and Shaikh, W., Rev. Sci Instrum Vol.69, No. 9, p 3350–3352, (1998)Google Scholar
5 ‘New Material for the Production of Fine Line Interconnects in Integrated Circuit Technology’, Berry, G.J., Caims, J.A. and Thomson, J.; J.Materials Science Letters,14, (1995), 844 Google Scholar
6 ‘The Production of Fine Metal Tracks from a range of Organometallic Compounds’, Berry, G.J., Cairns, J.A. and Thomson, J., Sensors and Actuators A51, 47–50, (1995)Google Scholar