Hostname: page-component-78c5997874-xbtfd Total loading time: 0 Render date: 2024-11-05T10:14:18.171Z Has data issue: false hasContentIssue false
  • English
  • Français

Microstructural development during Fabrication of Ti:LiNbC3 Optical Waveguides

Published online by Cambridge University Press:  21 February 2011

M. A. McCoy ,
S. A. Dregia ,
W. E. Lee  and
N. A. Sanford
M. A. McCoy
Affiliation:
Department of Materials Science and Engineering, The Ohio State University, Columbus, Ohio 43210
S. A. Dregia
Affiliation:
Department of Materials Science and Engineering, The Ohio State University, Columbus, Ohio 43210
N. A. Sanford
Affiliation:
Polaroid Corporation, Cambridge Massachusetts 02139
Get access

Abstract

The microstructural development of Ti:LiNbO3 optical waveguides as a function of annealing time and temperature was studied using transmission electron microscopy. The morphological evolution of the deposited Ti film can be characterized by three stages: (i) oxidation beginning at low temperatures, (ii) coarsening and secondary grain growth of the oxide film at higher temperatures and (iii) eventual film breakup and void formation. Secondary grain growth is driven by minimization of interfacial energy of grains which have a special epitaxial relationship with respect to the LiNbO3 substrate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 152: Symposium H – Optical Materials: Processing and Science , 1989 , 271
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Booth, R. C., Thin Solid Films, 126, 167(1985).Google Scholar
[2] Fisher, G., Am. Ceram. Soc. Bull., 66, 1530(1987).Google Scholar
[3] Lee, W. E., Sanford, N. A. and Heuer, A. H., J. Appl. Phys., 59, 2629(1986).CrossRefGoogle Scholar
[4] Lee, W. E., SPIE Vol.704, Integr. Opt. Circ. Eng. IV, 102(1986).Google Scholar
[5] Bravman, J. C. and Sinclair, R., J. Electr. Micr. Tech., 1, 53(1984).Google Scholar
[6] Read, P. M., Speakman, S. P., Hudson, M. D. and Considine, L., Nucl. Instr. Meth. Phys. Res., B15, 398(1986).Google Scholar
[7] Beck, P. A., Kremer, J. C., Demer, L. J. and Holzworth, M. L., Trans. AIME, 175, 372(1948).Google Scholar
[8] Thompson, C. V. and Smith, H.I. in Phase Transitions in Condensed Systems-Experiments and Theory (Mat. Res. Soc. Symp. Proc., 57, Pittsburgh, PA 1987) pp. 499–512.Google Scholar
[9] Rice, C. E. and Holmes, R.J., J. Appl. Phys., 60, 3836(1986).CrossRefGoogle Scholar
[10] Hunsperger, R. G., Integrated Optics: Theory and Technology, 2nd ed. (Springer-Verlag, New York, 1985), pp.70–7 2.Google Scholar