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In-Situ UHV Tem Investigations of the Initial Oxidation Stage of Copper Thin Films
Published online by Cambridge University Press: 10 February 2011
Abstract
The nucleation and growth of Cu2O due to oxidation of Cu(001) films were monitored at various temperatures and oxygen partial pressures. For all examined temperatures and pressures, Cu2O islands were observed to form epitaxially with respect to the copper film. The nucleation of these oxide islands was homogeneous –no clear evidence was observed for either steps or dislocations being preferential nucleation sites. Based on this data, we have developed a semiquantitative model of the initial oxidation stage where the dominant mechanism for transport, nucleation and growth of oxide islands is oxygen diffusion on the Cu surface. We are presently comparing our experimental data with nucleation rate theory, where the predictions qualitatively describe our observations, but not quantitatively.
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- Copyright © Materials Research Society 1998
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