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Growth of Ge1-xCx Alloys on Si by Combined Low-Energy Ion Beam and Molecular Beam Epitaxy Method

Published online by Cambridge University Press:  03 September 2012

H. Shibata
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan.
S. Kimura
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan.
P. Fons
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan.
A. Yamada
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan.
Y. Makita
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan.
A. Obara
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan.
N. Kobayashi
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan.
H. Takahashi
Affiliation:
Nippon Institute of Technology, 4-4-1, Gakuendai, Miyashirocho, Minamisaitama-gun, Saitama 345, Japan.
H. Katsumata
Affiliation:
Meiji University, 1-1-1 Higashi-Mita, Tama, Kawasaki, Kanagawa 214, Japan.
J. Tanabe
Affiliation:
Nippon Institute of Technology, 4-4-1, Gakuendai, Miyashirocho, Minamisaitama-gun, Saitama 345, Japan.
S. Uekusa
Affiliation:
Meiji University, 1-1-1 Higashi-Mita, Tama, Kawasaki, Kanagawa 214, Japan.
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Abstract

A combined ion beam and molecular beam epitaxy (CIBMBE) method was applied for the deposition of a Ge1-xCx alloy on Si(100) using a low-energy ( 50 – 100 eV ) C+ ion beam and a Ge molecular beam. Metastable Ge1-xCx solid solutions were formed up to x = 0.047, and the CIBMBE method was shown to have a very high potential to grow metastable Ge1-x,Cx alloys. It was also revealed that the sticking coefficient of C+ ions into Ge was ∼28% for Ei, = 100 eV and ∼18% for Ei = 50 eV. Structural characterization suggests that the deposited films are single crystals grown epitaxially on the substrate with twins on {111} planes. Characterization of lattice dynamics using Raman spectroscopy suggested that the deposited layers have a small amount of ion irradiation damage.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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