Hostname: page-component-586b7cd67f-dlnhk Total loading time: 0 Render date: 2024-11-25T17:48:11.792Z Has data issue: false hasContentIssue false
  • English
  • Français

Formation of New Interfacial Phases in Bimetallic Thin Film Couples Studied by in Situ Annealing X-ray Diffraction

Published online by Cambridge University Press:  26 February 2011

J. M. Vandenberg
J. M. Vandenberg*
Affiliation:
AT & T Bell Laboratories, Murry Hill, NJ 07974
Get access

Abstract

Interfacial reactions in bimetallic thin films have been studied by in-situ glancing angle X-ray diffraction which enables us to monitor all stages of the interface reaction in the temperature range 35 °-950° C Results are presented on new phase formation in evaporated Ag-Al and Cu-Al thin film couples, sputtered bimetallic Nb-Sn and Nb-Pb films and magnetic alloy films. New phases as well as phase transitions which are not known to exist in the bulk phase diagrams, were observed. These results provided evidence that phases other than those predicted by the first nucleation rule, grow during the initial metal-metal thin film interface reaction.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 54: Symposium E – Thin Films–Interfaces and Phenomena , 1985 , 171
Copyright
Copyright © Materials Research Society 1986

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Vandenberg, J. M., Temkin, H., Hamm, R. A. and DiGuiseppe, M. A., J. Appl. Phy. 53, 7385 (1982).Google Scholar
2. Vandenberg, J. M. and Hamm, R. A., Thin Solid Films 97, 313 (1982).Google Scholar
3. Hamm, R. A. and Vandenberg, J. M.. J. Appl. Phys. 56, 293 (1984).Google Scholar
4. Hatt, B. A. and Roberts, J. A., Acta Metall. 8, 575 (1960).Google Scholar
5. Hansen, M., Constitution of Binary Alloys, McGraw-Hill, New York, 1950, p. 1.Google Scholar
6. Baglin, J. E. E., D'Heurle, F. M. and Hammer, W. N., J. Appl. Phys. 50, 266 (1979).Google Scholar
7. Vandenberg, J. M., to be published.Google Scholar
8. Bene, R. W., Appl. Phys. Lett. 41, 529 (1962).Google Scholar
9. Nakahara, S., McCoy, R. J., Buene, L. and Vandenberg, J. M., Thin Solid Films 84, 185 (1981).Google Scholar
10. Vandenberg, J. M. and Hamm, R. A., Proceedings of the Symposium on Thin-Film Interfaces and Interactions, edited by Baglin, J. E. E. and Poate, J. M. (1980), p. 283.Google Scholar
11. Hong, M., van Dover, R. B., Vandenberg, J. M. and Bacon, D. D., accepted for publication in J. Magn. and Magn. Mat.Google Scholar
12. Vandenberg, J. M., Gurvitch, M., Hamm, R. A., Hong, M., and Rowell, J. M., IEEE Trans. Magn. MAG–21, 219 (1985).Google Scholar
13. Leger, J. M. and Tracy Hall, H., J.Less-Common Metals 34, 17 (1974).Google Scholar