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Critical Current Densities in Bi2Sr2Cacu2O8+D

Published online by Cambridge University Press:  28 February 2011

Shunji Nomura ,
Yutaka Yamada ,
Tomohisa Yamashita ,
Eriko Yoneda ,
Hisashi Yoshino  and
Ken Ando
Shunji Nomura
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA02139
Yutaka Yamada
Affiliation:
Kernforschungzentrum Karlsruhe GmbH, D7500 Karlsruhe 1, Weberstrasse 5, 3640 West Germany
Tomohisa Yamashita
Affiliation:
Research & Development Center TOSHIBA CORPORATION Komukai-Toshiba cho, Kawasaki 210, JAPAN
Eriko Yoneda
Affiliation:
Research & Development Center TOSHIBA CORPORATION Komukai-Toshiba cho, Kawasaki 210, JAPAN
Hisashi Yoshino
Affiliation:
Research & Development Center TOSHIBA CORPORATION Komukai-Toshiba cho, Kawasaki 210, JAPAN
Ken Ando
Affiliation:
Research & Development Center TOSHIBA CORPORATION Komukai-Toshiba cho, Kawasaki 210, JAPAN
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Abstract

Critical current densities and upper critical fields were measured for a single crystal of the high Tc oxide superconductor, Bi2Sr2CaCu2O8+d, within the ab basal plane and along the c axis. The anisotropy in critical current densities was observed to be Jc⊥/Jc//=10 in agreement with the anisotropy in resistivity for the normal state. The magnetic field dependence of the critical current densities can be interpreted by the anisotropy in the upper critical fields. The scaling of the critical current density with the magnetic field was found. The critical current density scaled to zero at fields Bc2 in the ab plane and along the c axis which were in good agreement with the upper critical fields measured by transport.

The anisotropy in flux pinning force density along the b axis, Fp//b, and along the a axis, Fp//a, was found to be Fp//b/Fp//a=3. The data provided strong evidence for flux pinning by the modulated structure in this system.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 169: Symposium M – High Temperature Superconductors: Fundamental Properties and Novel Materials Processing , 1989 , 923
Copyright
Copyright © Materials Research Society 1990

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