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Chemical Vapor Deposition of Gold
Published online by Cambridge University Press: 28 February 2011
Abstract
Chemical vapor deposition of gold from dimethyl-2,4-pentandionato gold (III) and two fluorinated derivatives is reported. At substrate temperatures of 200–300°C, high purity gold films were obtained on SiO2 and Si substrates. Films with resistivities down to 1.3 times that of bulk gold were obtained at deposition temperatures of ∼200°C, where films with very small grain size could be deposited.
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