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Ambipolar transport in MoS2 based electric double layer transistors

Published online by Cambridge University Press:  25 June 2013

Jianting Ye
Affiliation:
Quantum Phase electronics center and department of Applied Physics, The University of Tokyo, Tokyo, Japan
Yijin Zhang
Affiliation:
Quantum Phase electronics center and department of Applied Physics, The University of Tokyo, Tokyo, Japan
Yoshihiro Iwasa
Affiliation:
Quantum Phase electronics center and department of Applied Physics, The University of Tokyo, Tokyo, Japan
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Abstract

Making field effect transistors (FETs) on thin flake of single crystal isolated from layered materials was pioneered by the success of graphene. To overcome the difficulties of the zero band gap in graphene electronics, we report the fabrication of an electric double layer (EDL) transistor, a variant of FET, based on another layered material, MoS2. Using strong carrier tunability found in EDL coupled by ion movement, MoS2 transistor displayed an unambiguously ambipolar operation in addition to its commonly observed n-type transport. A high on/off ratio >104, large “ON” state conductivity of ∼mS, and a high reachable n2D ∼ 1×1014 cm-2 confirmed the high performance transistor operation being important for application. The high-density carriers of both holes and electrons can drive the MoS2 channel to metallic states indicating that new electronic phases could be accessed using the protocol established in making EDL gated transistors on layered materials.

Type
Articles
Copyright
Copyright © Materials Research Society 2013 

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References

REFERENCES

Novoselov, K. S., Geim, A. K., Morozov, S. V., Jiang, D., Zhang, Y., Dubonos, s. V., Grigorieva, I. V., and Firsov, A. A., Science 306, 666 (2005)CrossRefGoogle Scholar
Novoselov, K. S., Jiang, D., Schedin, F., Booth, T. J., Khotkevich, V. V., Morozov, S. V., and Geim, A. K., Proc. Natl. Acad. Scie. USA 102, 10451 (2005)CrossRefGoogle Scholar
Wilson, J. A., and Yoffe, A. D., Adv. Phys. 18, 193 (1969)CrossRefGoogle Scholar
Radisavlijevic, B., Radenovic, A., Brivio, J., Giacometti, V., and Kis, A., Nat. Nanotechnol. 6, 147 (2011)CrossRefGoogle Scholar
Shimotani, H., Asanuma, H., and Iwasa, Y., Jpn, J. Appl. Phys. 46, 3613 (2007)CrossRefGoogle Scholar
Al-Hilli, A. A., and Evans, B. J., J. Cryst. Growth 15, 93 (1972) / S. H. Mahalawy, and B. L. Evans, Phys. Stat. Sol. (b) 79,713 (1977) CrossRefGoogle Scholar
Zhang, Y. J., Ye, J. T., Matsuhashi, Y., and Iwasa, Y., Nano Lett. 12, 1136 (2012)CrossRefGoogle Scholar
Ye, J. T., Zhang, Y. J., Akashi, R., Bahramy, M. S., Arita, R., and Iwasa, Y. Science, 338, 1193 (2012)CrossRefGoogle Scholar