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Adsorption of Silicon Tetrachloride on Si(111) 7×7

Published online by Cambridge University Press:  25 February 2011

P. Gupta ,
P. A. Coon ,
B. G. Koehler  and
S. M. George
P. Gupta
Affiliation:
Dept. of Chemistry, Stanford University, Stanford, Calif. 94305
P. A. Coon
Affiliation:
Dept. of Chemistry, Stanford University, Stanford, Calif. 94305
B. G. Koehler
Affiliation:
Dept. of Chemistry, Stanford University, Stanford, Calif. 94305
S. M. George
Affiliation:
Dept. of Chemistry, Stanford University, Stanford, Calif. 94305
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Abstract

The kinetics of SiCl4 adsorption on Si(lll) 7×7 were studied using laser induced thermal desorption (LITD) and temperature programmed desorption (TPD) techniques. The initial reactive sticking coefficient of SiCl4 on Si(lll) 7×7 was observed to decrease with increasing surface temperature. This decrease was consistent with a precursor-mediated adsorption model. Both LITD and TPD experiments monitored SiCl2 as the main desorption product. These results suggest that SiC12 may be the stable chlorine species on the Si(lll) 7×7 surface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 131: Symposium E – Chemical Perspectives of Microelectronic Materials I , 1988 , 197
Copyright
Copyright © Materials Research Society 1989

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References

REFERENCES

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