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SEM Image Sharpness Analysis1

Published online by Cambridge University Press:  14 March 2018

M.T. Postek  and
A.E. Vladar
M.T. Postek
Affiliation:
NIST, Gaithersburgh MD, ULSI Research Laboratores, Palo Alto, CA
A.E. Vladar
Affiliation:
Hewlett-Packard, ULSI Research Laboratores, Palo Alto, CA

Extract

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Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. The industry requires that an automated instrument must be routinely capable of 5 nm resolution (or better) at 1.0 kV accelerating voltage for the measurement of nominal 0.25-0.35 micrometer semiconductor critical dimensions. Testing and proving that the instrument is performing at this level on a day-by-day basis is an industry need and concern which has been the object of a study at IMIST. The fundamentals and results are discussed in this paper.

Type
Research Article
Information
Microscopy Today , Volume 4 , Issue 8 , October 1996 , pp. 18 - 19
Copyright
Copyright © Microscopy Society of America 1996

Footnotes

1.

Contribution of the National Institute of Standards and Technology (WIST). This work was supported in part by the National Semiconductor Metrology Program at NIST; not subject to copyright.

References

2. Postek, M.T. and Vladar, A.E., Scanning 18(1996) 1-7.Google Scholar

3. Dodson, T.A. and Joy, D.C, Proc. Xllth int. Cong, for EM. San Francisco Press. (1990)406-407.Google Scholar