There is a solid consensus that new methods of structure fabrication, placement, and organization within the sub-10-nm resolution gap are urgently required to meet existing challenges in condensed matter, semiconductors, and biotechnologies. Standard top-down methods such as resist-based lithographies even used at the shortest available wavelengths have clearly identified limitations. On the other hand, bottom-up approaches, like scanning probe manipulation techniques, remain challenging when trying to generate reproducible, functional, and addressable nano-structures. Therefore, at the laboratory level new routes must be explored.