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Wetting and dewetting of ultra-thin Ni films on Si and SiO2 substrates

Published online by Cambridge University Press:  23 September 2015

Klaus van Benthem
Klaus van Benthem*
Affiliation:
Department of Chemical Engineering and Materials Science, University of California, Davis, CA 956116

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 775 - 776
Copyright
Copyright © Microscopy Society of America 2015 

References

[1] Thron, AM, Greene, P, Liu, K & van Benthem, K.. Structural changes during the reaction of Ni thin films with (100) silicon substrates. Acta Mater 2012; 60, 2668–2678.CrossRefGoogle Scholar
[2] Thron, AM, Pennycook, TJ, Chan, J, Luo, W, Jain, A, Riley, D, et al.. Formation of pre- silicide layers below Nii-xPtxSi/Si interfaces. Acta Mater 2013; 61, 2481–2488.CrossRefGoogle Scholar
[3] Thron, AM, Greene, P, Liu, K & van Benthem, K.. In-situ observation of equilibrium transitions in Ni films; agglomeration and impurity effects. Ultramicroscopy 2014; 137, 55–65.CrossRefGoogle ScholarPubMed
[4] Hihath, S, van Benthem, K, et al., in preparation 2015.Google Scholar
[5] This work was supported by a CAREER award of the US National Science Foundation (DMR-0955638), and a UC Laboratory Fee grant (#12-LR-238313)..Google Scholar