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Using Electron Channeling Contrast Imaging for Misfit Dislocation Characterization in Heteroepitaxial III-V/Si Thin Films

Published online by Cambridge University Press:  27 August 2014

Julia Deitz
Affiliation:
Dept. of Materials Science & Engineering, The Ohio State University, Columbus, OH, 43210, USA.
Santino Carnevale
Affiliation:
Dept. of Electrical & Computer Engineering, The Ohio State University, Columbus, OH, 43210, USA.
Marc De Graef
Affiliation:
Dept. of Materials Science & Engineering, Carnegie Mellon University, Pittsburgh, PA, 15213, USA.
Yoosuf N. Picard
Affiliation:
Dept. of Materials Science & Engineering, Carnegie Mellon University, Pittsburgh, PA, 15213, USA.
Stephen A. Ringel
Affiliation:
Dept. of Electrical & Computer Engineering, The Ohio State University, Columbus, OH, 43210, USA.
Tyler Grassman
Affiliation:
Dept. of Materials Science & Engineering, The Ohio State University, Columbus, OH, 43210, USA. Dept. of Electrical & Computer Engineering, The Ohio State University, Columbus, OH, 43210, USA.
David W. McComb
Affiliation:
Dept. of Materials Science & Engineering, The Ohio State University, Columbus, OH, 43210, USA.

Abstract

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Type
Abstract
Copyright
Copyright © Microscopy Society of America 2014 

References

[1] Grassman, T. J., et al, Appl. Phys. Lett. 94, 232106 (2009).Google Scholar
[2] Grassman, T. J., et al, Appl. Phys. Lett. 102, 142102 (2013).Google Scholar
[3] The authors of this work acknowledge support from the Air Force Office of Scientific Research, MURI contract # FA9550-12-1-0458, the Department of Energy under the FPACE program (DE-EE0005398), and the Ohio Office of Technology Investment Third Frontier program.Google Scholar