Use of a commercial RF plasma cleaner in eliminating adventitious carbon contamination in an XPS system

E Strein; D Allred; MR Linford

doi:10.1017/S1431927608087710

Use of a commercial RF plasma cleaner in eliminating adventitious carbon contamination in an XPS system

Published online by Cambridge University Press: 03 August 2008

E Strein ,

D Allred and

MR Linford

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E Strein: Affiliation:
Brigham Young University
D Allred: Affiliation:
Brigham Young University
MR Linford: Affiliation:
Brigham Young University

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Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

Type: Research Article
Information: Microscopy and Microanalysis , Volume 14 , Supplement S2 , August 2008 , pp. 818 - 819

DOI: https://doi.org/10.1017/S1431927608087710 [Opens in a new window]

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Use of a commercial RF plasma cleaner in eliminating adventitious carbon contamination in an XPS system

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