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Understanding Surface Modification of Silicon-based Materials using Gas Field Ion Source FIB for Nano-Machining Applications

Published online by Cambridge University Press:  23 November 2012

K.L. Klein ,
C. Huynh ,
L. Stern ,
A. Vladar ,
J. Melngailis  and
X. Cai
K.L. Klein
Affiliation:
Carl Zeiss NTS, LLC, Peabody, MA
C. Huynh
Affiliation:
Carl Zeiss NTS, LLC, Peabody, MA
L. Stern
Affiliation:
Carl Zeiss NTS, LLC, Peabody, MA
A. Vladar
Affiliation:
NIST, Gaithersburg, MD
J. Melngailis
Affiliation:
University of Maryland, College Park, MD
X. Cai
Affiliation:
University of Maryland, College Park, MD
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Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 18 , Issue S2: Proceedings of Microscopy & Microanalysis 2012 , July 2012 , pp. 830 - 831
Copyright
Copyright © Microscopy Society of America 2012

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