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Too Close for Comfort: Creating Two TEM Samples From Areas Separated By 270 Nanometers

Published online by Cambridge University Press:  05 August 2019

Nathan Wang*
Affiliation:
Maxim Integrated, Failure Analysis, San Jose, CA, USA.
George Perreault
Affiliation:
Maxim Integrated, Failure Analysis, San Jose, CA, USA.
*
*Corresponding author: [email protected]

Abstract

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Type
Advances in Focused Ion Beam Instrumentation and Techniques
Copyright
Copyright © Microscopy Society of America 2019 

References

[1]Wang, N and Li, S, Electronic Devices Failure Analysis 10 (2008), pp.12-16.Google Scholar
[2]Fujii, T et al. , in “Focused Ion Beam Systems”, ed. Yao, Nan, (Cambridge, New York) pp. 382-383.Google Scholar
[3]Volkert, CA and Minor, AM, MRS Bulletin, 32 (2007), pp. 389-399.Google Scholar