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Tem Studies of Single and Double Microdomain Layers of Block Copolymer

Published online by Cambridge University Press:  02 July 2020

N. Yao ,
M. Park ,
C. Harrison ,
D. H. Adamson ,
P. M. Chaikin  and
R. A. Register
N. Yao
Affiliation:
Princeton Materials Institute, Princeton, NJ08540
M. Park
Affiliation:
Princeton Materials Institute, Princeton, NJ08540 Department of Physics, Princeton, NJ08540
C. Harrison
Affiliation:
Princeton Materials Institute, Princeton, NJ08540 Department of Physics, Princeton, NJ08540
D. H. Adamson
Affiliation:
Princeton Materials Institute, Princeton, NJ08540
P. M. Chaikin
Affiliation:
Princeton Materials Institute, Princeton, NJ08540 Department of Physics, Princeton, NJ08540
R. A. Register
Affiliation:
Princeton Materials Institute, Princeton, NJ08540 Department of Chemical Engineering Princeton University, Princeton, NJ08540
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Diblock copolymers consist of two chemically different polymer chains (or blocks) joined by a covalent bond. Because of the incompatibility between the two blocks and connectivity constraints, diblock copolymers spontaneously self-assemble into microphase-separated nanometer size domains that exhibit ordered morphologies at equilibrium. Commonly observed microdomain morphologies in bulk samples are periodic arrangements of lamellae, cylinders, and spheres. Recent studies show that the thin films of such block copolymers are of great potential for many nanoapplications including nanolithography and template synthesis for inorganic materials. Here, we report TEM studies of osmylated and ozonated thin diblock copolymer films.

An asymmetric block copolymer was synthesized with a composition of 36 kg/mol for the poly(styrene)(PS) block and 11 kg/mole for the poly (butadiene)(PB) block such that the microphase separation produces PB cylinders in a matrix of PS. The films were spin-coated from solution onto thin silicon nitride windows and annealed above the glass transition temperature in vacuum.

Type
Developments in Measuring Polymer Microstructures
Information
Microscopy and Microanalysis , Volume 4 , Issue S2: Proceedings: Microscopy & Microanalysis '98, Microscopy Society of America 56th Annual Meeting, Microbeam Analysis Society 32nd Annual Meeting, Atlanta, Georgia July 12-16, 1998 , July 1998 , pp. 818 - 819
Copyright
Copyright © Microscopy Society of America

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References

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5. This work was supported by the MRSEC program of the National Science Foundation under Award Number DMR-9400362.Google Scholar