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TEM Sample Preparation Using a New Nanofabrication Technique Combining Electron-Beam-Induced Deposition and Low-Energy Ion Milling

Published online by Cambridge University Press:  11 October 2006

Kazutaka Mitsuishi ,
Masayuki Shimojo ,
Miyoko Tanaka ,
Masaki Takeguchi ,
Minghui Song  and
Kazuo Furuya
Kazutaka Mitsuishi
Affiliation:
National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
Masayuki Shimojo
Affiliation:
Saitama Institute of Technology, Saitama 369-0293, Japan
Miyoko Tanaka
Affiliation:
National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
Masaki Takeguchi
Affiliation:
National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
Minghui Song
Affiliation:
National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
Kazuo Furuya
Affiliation:
National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
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Abstract

A new TEM sample preparation technique using electron-beam-induced deposition combined with low-energy ion milling was used to fabricate for two different shapes of sample, conical and plate. High-quality HREM images can be obtained from samples prepared by this technique. A desired sample position can be obtained with high accuracy, and the total sample preparation time can be much less than conventional techniques. Because the gas deposition system used can easily be integrated in a conventional SEM, the method can be performed in any laboratory equipped with a SEM and an ion milling machine.

Keywords

TEM sample preparationselectron-beam-induced depositionion-beam millingnanofabrication
Type
Research Article
Information
Microscopy and Microanalysis , Volume 12 , Issue 6: Special Issue: Frontiers of Electron Microscopy in Materials Science , December 2006 , pp. 545 - 548
Copyright
© 2006 Microscopy Society of America

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References

REFERENCES

Han, M., Mitsuishi, K., Shimojo, M., & Furuya, K. (2004). Nanostructure characterization of tungsten-containing nanorods deposited by electron-beam-induced chemical vapour decomposition. Phil Mag 84, 1281–1289.Google Scholar
Hoyle, P.C., Cleaver, J.R.A., & Ahmed, H. (1996). Electron beam induced deposition from W(CO)6 at 2 to 20 keV and its applications. J Vac Sci Technol B 14, 662–673.Google Scholar
Ishida, M., Fujita, J., Ichihashi, T., Ochiai, Y., Kaito, T., & Matsui, S. (2003). Focused ion beam-induced fabrication of tungsten structures. J Vac Sci Technol B 21, 2728–2731.Google Scholar
Kato, N.I. (2004). Reducing focused ion beam damage to transmission electron microscopy samples. J Electron Microsc 53, 451–458.Google Scholar
Kawasaki, M., Yoshioka, T., & Shiojiri, M. (1999). A new specimen preparation method for cross-section TEM using diamond powders. J Electron Microsc 48, 131–137.Google Scholar
Koops, H.W.P., Kretz, J., Rudolph, M., Weber, M., Dahm, G., & Lee, K.L. (1994). Characterization and application of materials grown by electron-beam-induced deposition. Jpn J Appl Phys 33, 7099–7107.Google Scholar
Matsui, S. & Ichihashi, T. (1988). Electron-beam-induced chemical vapor-deposition by transmission electron-microscopy. Appl Phys Lett 53, 842–844.Google Scholar
Mitsuishi, K., Shimojo, M., Han, M., & Furuya, K. (2003). Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons. Appl Phys Lett 83, 2064–2066.Google Scholar
Mitsuishi, K., Shimojo, M., Tanaka, M., Takeguchi, M., & Furuya, K. (2005). Resolution in new nanofabrication technique combining electron-beam-induced deposition and low-energy ion milling. Jpn J Appl Phys 44, 5627–5630.Google Scholar
Tanaka, M., Shimojo, M., Mitsuishi, K., & Furuya, K. (2004). The size dependence of the nano-dots formed by electron-beam-induced deposition on the partial pressure of the precursor. Appl Phys A 78, 543–546.Google Scholar
Wang, Z., Kato, T., Hirayama, T., Kato, N., Sasaki, K., & Saka, H. (2005). Suraface damage induced by focused-ion-beam milling in a Si/Si p-n junction cross-sectional specimen. Appl Surf Sci 241, 80–86.Google Scholar