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TEM & Computer Analysis of Crystallographic Orientation Ratio in [1120]-Co Films on [002]-Cr Films Grown on Mechanically Textured Substrates

Published online by Cambridge University Press:  02 July 2020

Warren J. MoberlyChan ,
P. Dorsey ,
L. He ,
M. Zhang ,
B. Lairson  and
M. Lu
Warren J. MoberlyChan
Affiliation:
MCbyMC, Berkeley, CA , 95131, USA
P. Dorsey
Affiliation:
Komag, Inc., San Jose, CA95131, USA
L. He
Affiliation:
Komag, Inc., San Jose, CA95131, USA
M. Zhang
Affiliation:
Komag, Inc., San Jose, CA95131, USA
B. Lairson
Affiliation:
Komag, Inc., San Jose, CA95131, USA
M. Lu
Affiliation:
Komag, Inc., San Jose, CA95131, USA
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Extract

Circumferential mechanical texture (scratches) of hard drive substrates has improved head/media tribology; however, it has also been advantageous to the development of OR (Orientation Ratio) for longitudinal media. The magnetic dipoles prefer to circumferentially align with texture, which matches the direction heads read/write. The corrugated nature of films sputtered on fine texture scratches leads to an anisotropic stress state in the films, especially for those deposited at temperatures above ambient; and OR has been attributed to this anisotropic stress. A review article discusses possible causes of the OR such as: self-shadowing due to the texture lines during deposition, circumferential c-axis alignment, shape anisotropy of media grains, and magnetostrictive effects. Another work listed two requirements for OR: <> Co crystallographic growth texture in addition to circumferential texture scratches. The same study considered frequencies and depths of the texture scratches, and concluded that OR increased as the ratio of depth/frequency increased, rather than just as a function of Ra alone.

Type
Diffraction Techniques
Information
Microscopy and Microanalysis , Volume 6 , Issue S2: Proceedings: Microscopy & Microanalysis 2000, Microscopy Society of America 58th Annual Meeting, Microbeam Analysis Society 34th Annual Meeting, Microscopical Society of Canada/Societe de Microscopie de Canada 27th Annual Meeting, Philadelphia, Pennsylvania August 13-17, 2000 , August 2000 , pp. 956 - 957
Copyright
Copyright © Microscopy Society of America

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References

References:

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[6] NCEM at LBL is thanked for the use of their computer facilities; and the Materials Science & Engineering Dept. at Stanford University is gratefully acknowledged for the use of their TEM.Google Scholar