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Surface Rippling & Ion Etch Yields of Diamond Using a Focused Ion Beam: With or without Enhanced-Chemistry, Aspect Ratio Regulates Ion Etching

Published online by Cambridge University Press:  31 July 2006

WJ MoberlyChan ,
T Felter  and
M Wall
WJ MoberlyChan
Affiliation:
Lawrence Livermore National Laboratory
T Felter
Affiliation:
Lawrence Livermore National Laboratory
M Wall
Affiliation:
Lawrence Livermore National Laboratory

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2006 in Chicago, Illinois, USA, July 30 – August 3, 2005

Type
Abstract
Information
Microscopy and Microanalysis , Volume 12 , Issue S02 , August 2006 , pp. 1304 - 1305
Copyright
© 2006 Microscopy Society of America