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A Straightforward Method for Measuring the Elastic and Inelastic Mean Free Paths for Scattering of Fast Electrons in Technologically Important Thin-Film Oxides
Published online by Cambridge University Press:
22 July 2022
Department of Materials Science and Engineering, The Iby and Aladar Fleischman Faculty of Engineering, Tel Aviv University, Ramat Aviv, Tel Aviv, Israel
George Levi
Affiliation:
Department of Materials Science and Engineering, The Iby and Aladar Fleischman Faculty of Engineering, Tel Aviv University, Ramat Aviv, Tel Aviv, Israel
Tamir Amrani
Affiliation:
Department of Materials Science and Engineering, The Iby and Aladar Fleischman Faculty of Engineering, Tel Aviv University, Ramat Aviv, Tel Aviv, Israel
Yang Li
Affiliation:
Andrew and Erna Viterbi Faculty of Electrical and Computer Engineering, Technion – Israel Institute of Technology, Haifa, Israel
Guy Ankonina
Affiliation:
Andrew and Erna Viterbi Faculty of Electrical and Computer Engineering, Technion – Israel Institute of Technology, Haifa, Israel
Pini Shekhter
Affiliation:
Tel Aviv University Center for Nanoscience and Nanotechnology, Tel Aviv University, Ramat Aviv, Tel Aviv, Israel
Lior Kornblum
Affiliation:
Andrew and Erna Viterbi Faculty of Electrical and Computer Engineering, Technion – Israel Institute of Technology, Haifa, Israel
Ilan Goldfarb
Affiliation:
Department of Materials Science and Engineering, The Iby and Aladar Fleischman Faculty of Engineering, Tel Aviv University, Ramat Aviv, Tel Aviv, Israel
Amit Kohn*
Affiliation:
Department of Materials Science and Engineering, The Iby and Aladar Fleischman Faculty of Engineering, Tel Aviv University, Ramat Aviv, Tel Aviv, Israel
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The authors acknowledge funding from the ISF-NSFC joint research program (grant No. 3373/19). Sample fabrication was done with the support of the Technion's Micro-Nano Fabrication and Printing Unit (MNF&PU).Google Scholar