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STEM and EELS study of the Graphene/Bi2Se3 Interface

Published online by Cambridge University Press:  23 September 2015

D.M. Kepaptsoglou
Affiliation:
SuperSTEM Laboratory, STFC Daresbury Campus, Warrington, WA4 4AD, UK
D. Gilks
Affiliation:
Department of Physics, University of York, Heslington, York, YO10 5DD, UK,
L. Lari
Affiliation:
Department of Physics, University of York, Heslington, York, YO10 5DD, UK, York JEOL Nanocentre, University of York, Heslington, York, YO10 5BR, UK
Q.M. Ramasse
Affiliation:
SuperSTEM Laboratory, STFC Daresbury Campus, Warrington, WA4 4AD, UK
P. Galindo
Affiliation:
Department of Computer Science and Engineering, Universidad de Cadiz, 11510 Puerto Real, Spain
M. Weinert
Affiliation:
University of Wisconsin Milwaukee, Milwaukee, 53211,WI, USA
L. Li
Affiliation:
University of Wisconsin Milwaukee, Milwaukee, 53211,WI, USA
G. Nicotra
Affiliation:
Institute for microelectronics and microsystems, CNR Catania, 95121 Catania CT, Sicilia, Italy

Abstract

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Type
Abstract
Copyright
Copyright © Microscopy Society of America 2015 

References

References:

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[2] Kou, L., et al., Nano Lett. 13 (2012), p 6251.CrossRefGoogle Scholar
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[5] The authors acknowledge funding from EPSRC via research grants EP/K013114/1 and EP/K032852/1. SuperSTEM is the U.K. National Facility for Aberration-Corrected STEM funded by the EPSRC. Part of this work was performed at BeyondNano CNR-IMM, supported by MIUR under the project Beyond-Nano (PON a3_00363).Google Scholar